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pISSN : 1225-1429 / eISSN : 2234-5078

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Growth of epitaxial silicon by hot-wall chemical vapor deposition (CVD) technique and its thermochemical analysis

Journal of the Korean Crystal Growth and Crystal Technology
Abbr : J. Korean Cryst. Growth Cryst. Technol.
2002, 12(4), pp.215-221
Publisher : The Korea Association Of Crystal Growth, Inc.
Research Area : Materials Science and Engineering

DeoksunYoon 1 WookhyunKoh 2 SeokkiYeo 3 HongH.Lee 4 ChinhoPark 5

1Yeungnam University
2Yeungnam University
3Yeungnam University
4서울대학교
5Yeungnam University

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