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Characteristic of Zr(Si)N film as a diffusion barrier between Cu metal and Si substrate

Journal of the Korean Crystal Growth and Crystal Technology
Abbr : J. Korean Cryst. Growth Cryst. Technol.
2002, 12(6), pp.283-287
Publisher : The Korea Association Of Crystal Growth, Inc.
Research Area : Materials Science and Engineering

JwayeonKim 1 ByungchulCho 2 SanghoonChai 3 HeonchangKim 4 KyeongsoonPark 5

1Hoseo University
2Hoseo University
3Hoseo University
4Hoseo University
5Sejong University

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