Korean | English

pISSN : 1225-1429 / eISSN : 2234-5078

2020 KCI Impact Factor : 0.17
Home > Explore Content > All Issues > Article View
2 of 6

Application of rapid thermal annealing process to the aluminum induced crystallization of amorphous silicon thin film

Journal of the Korean Crystal Growth and Crystal Technology
Abbr : J. Korean Cryst. Growth Cryst. Technol.
2019, 29(2), pp.50-53
Publisher : The Korea Association Of Crystal Growth, Inc.
Research Area : Materials Science and Engineering

황지현 1 양수원 2 KIM YOUNG KWAN 3

1인천대학교 물리학과
2인천대학교 신소재공학과
3인천대학교

등재

Statistics

icon116 Viewed

Tools

iconPrint this page

iconDownload PDF

Search PDF

Close X