The effect of chemical composition on the structural and thermal properties of TiZrN thin films was studied. Asthe Zr fraction in the deposited TixZr1-xN (x = 0.87, 0.82, 0.7, 0.6, and 0.28) increased, microstructural changes consisted ofreduction in the grain size and a gradual transition from columnar structure to granular structure were observed. In addition,it was also confirmed that a gradual crystal phase transition from TiN to TiZrN has occurred as the Zr fraction increasedup to 0.4. After heat t reatment a t 900°C, Ti0.82Zr0.18N and Ti0.7Zr0.3N layers were converted to a form in which rutile phaseTiO2 and TiZrO4 oxides coexist, while Ti0.6Zr0.4N layer was converted to TiZrO4 oxide. Among the five compositions ofTiZrN films, the Ti0.6Zr0.4N showed the best high temperature stability and produced a significant enhancement in thethermal oxidation resistance of Inconel 617 through suppressing the surface diffusion of Cr caused by thermal oxidation of the Inconel 617 substrate.