@article{ART001118058},
author={Lee,Jae-Dal and Kieseo Bae and 홍영기 and 노덕길},
title={Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ)},
journal={Textile Coloration and Finishing },
issn={1229-0033},
year={2005},
volume={17},
number={3},
pages={34-42}
TY - JOUR
AU - Lee,Jae-Dal
AU - Kieseo Bae
AU - 홍영기
AU - 노덕길
TI - Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ)
JO - Textile Coloration and Finishing
PY - 2005
VL - 17
IS - 3
PB - The Korean Society Of Dyers And Finishers
SP - 34
EP - 42
SN - 1229-0033
AB - this work, a practical separation performance was investigated on aqueous alcohol solutions, especially for iso-propyl alcohol (IPA), which is usually used during the semi- conductor rinsing process. The removal of various substances from waste aqueous IPA solutions was carried out by microfiltration with 0.1～1㎛ pore size of mean diameter as a pre-filter.Permeability and molecular weight cut-off of the functional polysulfone(PSf) ultrafiltration membrane to purify waste aqueous IPA solutions were measured through the ultrafiltration test. The solute rejection of PSf membrane had 92% in 1,000ppm aqueous PEG solution with PEG molecular weight 10,000, the molecular weight cut-off had 10,000.The IPA concentration on the CMPA-K+ membrane performance using pervaporation module system could be increased from 95.04 wt% to more than 98.50wt% in about 9hr at operation temperature of 70℃ using the pervaporation module system.
KW - Membrane;Pervaporation;Flux;Solute rejection;IPA;UF membrane
DO -
UR -
ER -
Lee,Jae-Dal, Kieseo Bae, 홍영기 and 노덕길. (2005). Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ). Textile Coloration and Finishing , 17(3), 34-42.
Lee,Jae-Dal, Kieseo Bae, 홍영기 and 노덕길. 2005, "Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ)", Textile Coloration and Finishing , vol.17, no.3 pp.34-42.
Lee,Jae-Dal, Kieseo Bae, 홍영기, 노덕길 "Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ)" Textile Coloration and Finishing 17.3 pp.34-42 (2005) : 34.
Lee,Jae-Dal, Kieseo Bae, 홍영기, 노덕길. Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ). 2005; 17(3), 34-42.
Lee,Jae-Dal, Kieseo Bae, 홍영기 and 노덕길. "Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ)" Textile Coloration and Finishing 17, no.3 (2005) : 34-42.
Lee,Jae-Dal; Kieseo Bae; 홍영기; 노덕길. Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ). Textile Coloration and Finishing , 17(3), 34-42.
Lee,Jae-Dal; Kieseo Bae; 홍영기; 노덕길. Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ). Textile Coloration and Finishing . 2005; 17(3) 34-42.
Lee,Jae-Dal, Kieseo Bae, 홍영기, 노덕길. Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ). 2005; 17(3), 34-42.
Lee,Jae-Dal, Kieseo Bae, 홍영기 and 노덕길. "Separation Purification Characteristics of Rinsing Solution in Semiconductor Process usingHigh Performance Polymer Membranes (Ⅰ)" Textile Coloration and Finishing 17, no.3 (2005) : 34-42.
