Polymerization of Tetraethoxysilane by Using Remote Argon/dinitrogen oxide Microwave Plasma

천태일; Volker Rossbach

Polymerization of Tetraethoxysilane by Using Remote Argon/dinitrogen oxide Microwave Plasma

Textile Coloration and Finishing
Abbr : Text. Color. and Finish.
2009, 21(3), pp.19-25
Publisher : The Korean Society Of Dyers And Finishers
Research Area : Engineering > Fiber Engineering > Dyeing Engineering

천태일 ¹, Volker Rossbach ²

¹동의대학교
²Dresden University of Technology

Accredited

ABSTRACT

Polymerization of tetraethoxysilane on a glass substrate was investigated by remote microwave plasma using argon with portions of nitrous oxide as carrier gas. Transparent layer like a thickness of 0.5 µm ‐ 3 µm were obtained, differing in chemical composition, depending on plasma power and treatment time as well as on ageing time. In general the milder the treatment and the shorter the ageing was, the higher was the content of organic structural elements in the layer. We have identified that the chemical structure of our samples composed of mainly Si‐O‐ and Si‐C‐ groups containing aliphatics, carbonyl groups. These results were obtained by X‐ray photon spectroscopy, Fourier transformed infrared spectroscopy, and scanning electron microscope combined with Energy dispersive X‐ray spectroscopy.

KEYWORDS

remote micro wave plasma, plasma polymerization and deposition, plasma enhanced chemical vapour deposition, tetraethoxysilane, scanning electron microscope, energy dispersive X-ray spectroscopy, X-ray photon spectroscopy, fourier transformed infrared spectroscopy

Citation status

* References for papers published after 2023 are currently being built.

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