@article{ART002963512},
author={Lim Chaehun and Kwak Cheol Hwan and Jeong Seo Gyeong and Kim Daesup and Lee Young-Seak},
title={Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment},
journal={Carbon Letters},
issn={1976-4251},
year={2023},
volume={33},
number={1},
pages={139-145},
doi={10.1007/s42823-022-00410-1}
TY - JOUR
AU - Lim Chaehun
AU - Kwak Cheol Hwan
AU - Jeong Seo Gyeong
AU - Kim Daesup
AU - Lee Young-Seak
TI - Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment
JO - Carbon Letters
PY - 2023
VL - 33
IS - 1
PB - Korean Carbon Society
SP - 139
EP - 145
SN - 1976-4251
AB - Removing CO2 gas to address the global climate crisis is one of the most urgent agendas. To improve the CO2 adsorption ability of activated carbon, nitrogen plasma surface treatment was conducted. The effect of nitrogen plasma treatment on the surface chemistry and pore geometry of activated carbon was extensively analyzed. The porosity and surface groups of the activated carbon varied with the plasma treatment time. By plasma treatment for a few minutes, the microporosity and surface functionality could be simultaneously controlled. The changed microporosity and nitrogen groups affected the CO2 adsorption capacity and CO2 adsorption selectivity over N2. This simultaneous surface etching and functionalization effect could be achieved with a short operating time and low energy consumption.
KW - CO2 adsorption Activated carbon Nitrogen plasma Surface treatment
DO - 10.1007/s42823-022-00410-1
ER -
Lim Chaehun, Kwak Cheol Hwan, Jeong Seo Gyeong, Kim Daesup and Lee Young-Seak. (2023). Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment. Carbon Letters, 33(1), 139-145.
Lim Chaehun, Kwak Cheol Hwan, Jeong Seo Gyeong, Kim Daesup and Lee Young-Seak. 2023, "Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment", Carbon Letters, vol.33, no.1 pp.139-145. Available from: doi:10.1007/s42823-022-00410-1
Lim Chaehun, Kwak Cheol Hwan, Jeong Seo Gyeong, Kim Daesup, Lee Young-Seak "Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment" Carbon Letters 33.1 pp.139-145 (2023) : 139.
Lim Chaehun, Kwak Cheol Hwan, Jeong Seo Gyeong, Kim Daesup, Lee Young-Seak. Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment. 2023; 33(1), 139-145. Available from: doi:10.1007/s42823-022-00410-1
Lim Chaehun, Kwak Cheol Hwan, Jeong Seo Gyeong, Kim Daesup and Lee Young-Seak. "Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment" Carbon Letters 33, no.1 (2023) : 139-145.doi: 10.1007/s42823-022-00410-1
Lim Chaehun; Kwak Cheol Hwan; Jeong Seo Gyeong; Kim Daesup; Lee Young-Seak. Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment. Carbon Letters, 33(1), 139-145. doi: 10.1007/s42823-022-00410-1
Lim Chaehun; Kwak Cheol Hwan; Jeong Seo Gyeong; Kim Daesup; Lee Young-Seak. Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment. Carbon Letters. 2023; 33(1) 139-145. doi: 10.1007/s42823-022-00410-1
Lim Chaehun, Kwak Cheol Hwan, Jeong Seo Gyeong, Kim Daesup, Lee Young-Seak. Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment. 2023; 33(1), 139-145. Available from: doi:10.1007/s42823-022-00410-1
Lim Chaehun, Kwak Cheol Hwan, Jeong Seo Gyeong, Kim Daesup and Lee Young-Seak. "Enhanced CO2 adsorption of activated carbon with simultaneous surface etching and functionalization by nitrogen plasma treatment" Carbon Letters 33, no.1 (2023) : 139-145.doi: 10.1007/s42823-022-00410-1
