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Review of n-type doping diamond: methods, elements, and properties

  • Carbon Letters
  • Abbr : Carbon Lett.
  • 2025, 35(5), pp.1981~2009
  • DOI : 10.1007/s42823-025-00970-y
  • Publisher : Korean Carbon Society
  • Research Area : Natural Science > Natural Science General > Other Natural Sciences General
  • Received : May 2, 2025
  • Accepted : August 16, 2025
  • Published : December 11, 2025

Li Mingke 1 Yu Dayang 1 Shen Shengnan 1 Liu Xin 1

1Wuhan University

Accredited

ABSTRACT

Doping diamond exhibits excellent photoelectric properties, making it promising for applications in wide-bandgap semiconductors, high-temperature devices, and high-power electronics. However, research on n-type doping remains limited. This paper reviews the main n-type doping methods for diamond: ion implantation (I/I), chemical vapor deposition (CVD), high pressure–high temperature (HPHT), deuterated method (DM), surface charge transfer doping (SCTD), and laser irradiation (LI). It analyzes the parameters, advantages, and disadvantages of each technique while classifying common single-element and multi-element co-doping methods. Single-element dopants include Group IA (Li, Na, K), Group ⅡA (Be, Mg), Group VA (N, P, As, Sb), and Group ⅥA (O, S, Se, Te) elements. Multi-element co-doping often combines B-P, B-S, B-O, and B-N pairs. Additionally, we examine the atomic structures of these dopants, introduce commonly used simulation models, and compare the electronic characteristics of synthesized n-type doping diamonds. Finally, we summarize the challenges of n-type doping diamond in doping equipment, processes, and electronic devices, and propose possible improvements and future development directions.

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