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Growth of p-ZnO by RF-DC magnetron co-sputtering

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2004, 14(6), pp.277~280
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

Seung-min Kang 1

1한서대학교

Accredited

ABSTRACT

p-ZnO films have been grown on (0001)sapphire substrates by RF-DC magnetron co-sputtering. The p-ZnO single crystalline thin films of the thickness about 120 nm were grown successfully. The dopant (Aluminum) was sputtered simultaneously from Al metal target by DC sputtering during rf-magnetron sputtering of ZnO at the substrate temperatures of 400oC and 600oC respectively. The crystallinity and optical properties of as-grown P-ZnO films have been characterized.

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