Phase transformation and magnetic properties of NiFe thin films on Si(100) wafer and SiO2/Si(100) substrate by co-sputtering (Si(100) wafer와 SiO2/Si(100) 기판에 동시 스퍼터링법으로 증착된 NiFe 합금 박 막의 상변화 및 자기적 특성)

강대식; Song Jong Han (송종한); Nam, Joong-Hee (남중희); Cho Jeong Ho (조정호); Myoungpyo Chun (전명표)

Phase transformation and magnetic properties of NiFe thin films on Si(100) wafer and SiO2/Si(100) substrate by co-sputtering

Journal of the Korean Crystal Growth and Crystal Technology
Abbr : J. Korean Cryst. Growth Cryst. Technol.
2010, 20(5), pp.216-220
Publisher : The Korea Association Of Crystal Growth, Inc.
Research Area : Engineering > Materials Science and Engineering

강대식 ¹, Song Jong Han ², Nam, Joong-Hee ¹, Cho Jeong Ho ¹, Myoungpyo Chun ¹

¹한국세라믹기술원
²한국과학기술연구원

Accredited

ABSTRACT

Ni-Fe alloys have various applications such as thin film inductor, thin film transformer, magnetic head’s shield case, etc. Magnetic properties of Ni-Fe thin films depend on the process parameters such as thickness, contents, deposition rate, substrates, etc. In this study, NiFe films with a thickness of about 150nm were deposited on Si(100) wafer and SiO2/Si(100) substrate at room temperature by a DC magnetron co-sputtering using Fe and Ni targets. Their phase formation and magnetic properties as a function of annealing temperature were investigated with XRD, FE-SEM and VSM. The assputtered films have BCC structure. With increasing annealing temperature, NiFe thin film for SiO2/Si(100) substrate transformed completely from BCC to FCC phase above 500oC, but some BCC phase remained above 500oC on Si(100)wafer. For samples annealed at 450oC, squareness ratio of NiFe thin film shows peak value and its saturation magnetization is around 0.0118 emu, which means that the optimum annealing temperature of NiFe thin film seems to be 450oC. The saturation magnetization of films decreased rapidly above the annealing temperature of 500oC due to phase transformation from BCC to FCC phase.

KEYWORDS

Soft-magnetic, Phase transformation, NiFe

Citation status

* References for papers published after 2023 are currently being built.

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