@article{ART001939716},
author={이현규 and 이석신 and 김비룡 and Tae-Eon Park and Young-Hoon Yun},
title={Microstructure and plasma resistance of Y2O3 ceramics},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2014},
volume={24},
number={6},
pages={268-273},
doi={10.6111/JKCGCT.2014.24.6.268}
TY - JOUR
AU - 이현규
AU - 이석신
AU - 김비룡
AU - Tae-Eon Park
AU - Young-Hoon Yun
TI - Microstructure and plasma resistance of Y2O3 ceramics
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2014
VL - 24
IS - 6
PB - The Korea Association Of Crystal Growth, Inc.
SP - 268
EP - 273
SN - 1225-1429
AB - Y2O3 ceramic specimens were fabricated from the granular powder, obtained by spray drying process from theslurry. The slurry was prepared by mixing PVA binder, NaOH for Ph control, PEG and Y2O3 powder. The Y2O3 specimenwas shaped in size of Ø14 mm and then sintered at 1650oC. The characteristics, microstructure, densities and plasmaresistance of the Y2O3 specimens were investigated with the function of forming pressure and sintering time. Y2O3specimens were exposed under the CHF3/O2/Ar plasma, the dry etching treatment of specimens was carried out by thephysical reaction etching of Ar+ion beam and the chemical reaction etching of F− ion decomposed from CHF3. Withincreasing sintering time, Y2O3 specimens showed relatively high density and strong resistance in plasma etching test.
KW - Yttria (Y2O3);Granular powder;Plasma resistance;Microstructure
DO - 10.6111/JKCGCT.2014.24.6.268
ER -
이현규, 이석신, 김비룡, Tae-Eon Park and Young-Hoon Yun. (2014). Microstructure and plasma resistance of Y2O3 ceramics. Journal of the Korean Crystal Growth and Crystal Technology, 24(6), 268-273.
이현규, 이석신, 김비룡, Tae-Eon Park and Young-Hoon Yun. 2014, "Microstructure and plasma resistance of Y2O3 ceramics", Journal of the Korean Crystal Growth and Crystal Technology, vol.24, no.6 pp.268-273. Available from: doi:10.6111/JKCGCT.2014.24.6.268
이현규, 이석신, 김비룡, Tae-Eon Park, Young-Hoon Yun "Microstructure and plasma resistance of Y2O3 ceramics" Journal of the Korean Crystal Growth and Crystal Technology 24.6 pp.268-273 (2014) : 268.
이현규, 이석신, 김비룡, Tae-Eon Park, Young-Hoon Yun. Microstructure and plasma resistance of Y2O3 ceramics. 2014; 24(6), 268-273. Available from: doi:10.6111/JKCGCT.2014.24.6.268
이현규, 이석신, 김비룡, Tae-Eon Park and Young-Hoon Yun. "Microstructure and plasma resistance of Y2O3 ceramics" Journal of the Korean Crystal Growth and Crystal Technology 24, no.6 (2014) : 268-273.doi: 10.6111/JKCGCT.2014.24.6.268
이현규; 이석신; 김비룡; Tae-Eon Park; Young-Hoon Yun. Microstructure and plasma resistance of Y2O3 ceramics. Journal of the Korean Crystal Growth and Crystal Technology, 24(6), 268-273. doi: 10.6111/JKCGCT.2014.24.6.268
이현규; 이석신; 김비룡; Tae-Eon Park; Young-Hoon Yun. Microstructure and plasma resistance of Y2O3 ceramics. Journal of the Korean Crystal Growth and Crystal Technology. 2014; 24(6) 268-273. doi: 10.6111/JKCGCT.2014.24.6.268
이현규, 이석신, 김비룡, Tae-Eon Park, Young-Hoon Yun. Microstructure and plasma resistance of Y2O3 ceramics. 2014; 24(6), 268-273. Available from: doi:10.6111/JKCGCT.2014.24.6.268
이현규, 이석신, 김비룡, Tae-Eon Park and Young-Hoon Yun. "Microstructure and plasma resistance of Y2O3 ceramics" Journal of the Korean Crystal Growth and Crystal Technology 24, no.6 (2014) : 268-273.doi: 10.6111/JKCGCT.2014.24.6.268
