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Solid-state synthesis of yttrium oxyfluoride powders and their application to plasma spray coating

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2021, 31(6), pp.276-281
  • DOI : 10.6111/JKCGCT.2021.31.6.276
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : November 15, 2021
  • Accepted : November 30, 2021
  • Published : December 31, 2021

Jung-Il Lee 1 Young-Ju Kim 2 Chae Hui Ra 1 yun jeong kim 1 PARKSEONHJU 1 sin gyoung seon 1 Ha TaeBin 1 Ji Hyeon Kim 1 Gu Hun Jeong 1 Jeong-ho Ryu 1

1한국교통대학교
2(주)대찬테크

Accredited

ABSTRACT

In order to manufacture a semiconductor circuit, etching, cleaning, and deposition processes are repeated. During these processes, the inside of the processing chamber is exposed to corrosive plasma. Therefore, the coating of the innerwall of the semiconductor equipment with a plasma-resistant material has been attempted to minimize the etching of the coating and particle contaminant generation. In this study, we synthesized yttrium oxyfluoride (YOF) powder by a solidstate reaction using Y2O3 and YF3 as raw materials. Mixing ratio of the Y2O3 and YF3 was varied from 1.0:1.0 to 1.0:1.6. Effects of the mixing ratio on crystal structure and microstructure of the synthesized YOF powder were investigated using XRD and FE-SEM. The synthesized YOF powder was successfully applied to plasma spray coating process on Al substrate.

Citation status

* References for papers published after 2023 are currently being built.

This paper was written with support from the National Research Foundation of Korea.