본문 바로가기
  • Home

Preparation of photoresist-derived carbon micropatterns by proton ion beam lithography and pyrolysis

  • Carbon Letters
  • Abbr : Carbon Lett.
  • 2017, 24(1), pp.55-61
  • Publisher : Korean Carbon Society
  • Research Area : Natural Science > Natural Science General > Other Natural Sciences General

남희균 1 jin-mook jung 1 Hwang In-Tae 2 Shin, Junhwa 2 정창희 2 Choi, Jae-Hak 1

1충남대학교
2한국원자력연구원

Accredited

ABSTRACT

Carbon micropatterns (CMs) were fabricated from a negative-type SU-8 photoresist by proton ion beam lithography and pyrolysis. Well-defined negative-type SU-8 micropatterns were formed by proton ion beam lithography at the optimized fluence of 1×1015 ions cm–2 and then pyrolyzed to form CMs. The crosslinked network structures formed by proton irradiation were converted to pseudo-graphitic structures by pyrolysis. The fabricated CMs showed a good electrical conductivity of 1.58×102 S cm–1 and a very low surface roughness.

Citation status

This is the result of checking the information with the same ISSN, publication year, volume, and start page between the WoS and the KCI journals. (as of 2023-07-14)

Total Citation Counts(KCI+WOS) (2) This is the number of times that the duplicate count has been removed by comparing the citation list of WoS and KCI.

Scopus Citation Counts (2) This is the result of checking the information with the same ISSN, publication year, volume, and start page between articles in KCI and the SCOPUS journals. (as of 2024-10-01)

* References for papers published after 2023 are currently being built.

This paper was written with support from the National Research Foundation of Korea.