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Preparation of photoresist-derived carbon micropatterns by proton ion beam lithography and pyrolysis

  • Carbon Letters
  • Abbr : Carbon Lett.
  • 2017, 24(1), pp.55-61
  • Publisher : Korean Carbon Society
  • Research Area : Natural Science > Natural Science General > Other Natural Sciences General

남희균 1 jin-mook jung 1 Hwang In-Tae 2 Shin, Junhwa 2 정창희 2 Choi, Jae-Hak 1

1충남대학교
2한국원자력연구원

Accredited

ABSTRACT

Carbon micropatterns (CMs) were fabricated from a negative-type SU-8 photoresist by proton ion beam lithography and pyrolysis. Well-defined negative-type SU-8 micropatterns were formed by proton ion beam lithography at the optimized fluence of 1×1015 ions cm–2 and then pyrolyzed to form CMs. The crosslinked network structures formed by proton irradiation were converted to pseudo-graphitic structures by pyrolysis. The fabricated CMs showed a good electrical conductivity of 1.58×102 S cm–1 and a very low surface roughness.

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This paper was written with support from the National Research Foundation of Korea.