@article{ART002958904},
author={Gürsoy Mehmet and Çıtak Emre and Karaman Mustafa},
title={Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique},
journal={Carbon Letters},
issn={1976-4251},
year={2022},
volume={32},
number={3},
pages={781-787},
doi={10.1007/s42823-021-00309-3}
TY - JOUR
AU - Gürsoy Mehmet
AU - Çıtak Emre
AU - Karaman Mustafa
TI - Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique
JO - Carbon Letters
PY - 2022
VL - 32
IS - 3
PB - Korean Carbon Society
SP - 781
EP - 787
SN - 1976-4251
AB - Large-area graphene of the order of centimeters was deposited on copper substrates by low-pressure chemical vapor deposition (LPCVD) using hexane as the carbon source. The effect of temperature and the carrier gas flowrates on the quality and uniformity of the as-deposited graphene was investigated using the Raman analysis. The film deposited at 870 °C with a total carrier gas flowrate of 50 sccm is predominantly single-layer with very low defects according to the Raman spectra. The 2D/G peak intensity ratios obtained from the Raman spectra of samples from three different locations of graphene deposited on a whole copper catalyst was used to calculate the large-area uniformity. Based on the results, a very high uniformity of 89.6% was calculated for the graphene deposited at 870 °C. The uniformity was observed to decrease with increasing temperature. Similar to the thickness uniformity, the electrical conductivity values obtained as a result of I–V measurements and water contact angle measurements were found to be close to each other for the graphene deposited under the same deposition conditions.
KW - Graphene LPCVD Uniformity Large-area
DO - 10.1007/s42823-021-00309-3
ER -
Gürsoy Mehmet, Çıtak Emre and Karaman Mustafa. (2022). Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique. Carbon Letters, 32(3), 781-787.
Gürsoy Mehmet, Çıtak Emre and Karaman Mustafa. 2022, "Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique", Carbon Letters, vol.32, no.3 pp.781-787. Available from: doi:10.1007/s42823-021-00309-3
Gürsoy Mehmet, Çıtak Emre, Karaman Mustafa "Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique" Carbon Letters 32.3 pp.781-787 (2022) : 781.
Gürsoy Mehmet, Çıtak Emre, Karaman Mustafa. Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique. 2022; 32(3), 781-787. Available from: doi:10.1007/s42823-021-00309-3
Gürsoy Mehmet, Çıtak Emre and Karaman Mustafa. "Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique" Carbon Letters 32, no.3 (2022) : 781-787.doi: 10.1007/s42823-021-00309-3
Gürsoy Mehmet; Çıtak Emre; Karaman Mustafa. Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique. Carbon Letters, 32(3), 781-787. doi: 10.1007/s42823-021-00309-3
Gürsoy Mehmet; Çıtak Emre; Karaman Mustafa. Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique. Carbon Letters. 2022; 32(3) 781-787. doi: 10.1007/s42823-021-00309-3
Gürsoy Mehmet, Çıtak Emre, Karaman Mustafa. Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique. 2022; 32(3), 781-787. Available from: doi:10.1007/s42823-021-00309-3
Gürsoy Mehmet, Çıtak Emre and Karaman Mustafa. "Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique" Carbon Letters 32, no.3 (2022) : 781-787.doi: 10.1007/s42823-021-00309-3
