@article{ART003062621},
author={Lim Chaehun and Ha Seongmin and Ha Naeun and Jeong Seo Gyeong and Lee, Young-Seak},
title={Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching},
journal={Carbon Letters},
issn={1976-4251},
year={2024},
volume={34},
number={2},
pages={611-617},
doi={10.1007/s42823-023-00597-x}
TY - JOUR
AU - Lim Chaehun
AU - Ha Seongmin
AU - Ha Naeun
AU - Jeong Seo Gyeong
AU - Lee, Young-Seak
TI - Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching
JO - Carbon Letters
PY - 2024
VL - 34
IS - 2
PB - Korean Carbon Society
SP - 611
EP - 617
SN - 1976-4251
AB - The effects of different plasma agent species (CF4, N2) over the conductivity of CFX cathode material were identified. Both plasma treatments have surface etching effect, while the CF4 plasma treatment has C–F bond modification effect and the N2 plasma treatment has defluorination effect. The changes of surface chemical species and porosity along the plasma agent were elucidated. Moreover, the electrochemical properties of plasma-treated CFX confirmed the effects of plasma treatments. The charge-transfer resistance of plasma-treated CFX was maximum 60.3% reduced than the pristine CFX. The effects of surface chemical modification coupled with etching along the plasma gas agents were compared and identified with their reaction mechanisms.
KW - Lithium-ion primary battery CFX Plasma Surface treatment
DO - 10.1007/s42823-023-00597-x
ER -
Lim Chaehun, Ha Seongmin, Ha Naeun, Jeong Seo Gyeong and Lee, Young-Seak. (2024). Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching. Carbon Letters, 34(2), 611-617.
Lim Chaehun, Ha Seongmin, Ha Naeun, Jeong Seo Gyeong and Lee, Young-Seak. 2024, "Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching", Carbon Letters, vol.34, no.2 pp.611-617. Available from: doi:10.1007/s42823-023-00597-x
Lim Chaehun, Ha Seongmin, Ha Naeun, Jeong Seo Gyeong, Lee, Young-Seak "Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching" Carbon Letters 34.2 pp.611-617 (2024) : 611.
Lim Chaehun, Ha Seongmin, Ha Naeun, Jeong Seo Gyeong, Lee, Young-Seak. Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching. 2024; 34(2), 611-617. Available from: doi:10.1007/s42823-023-00597-x
Lim Chaehun, Ha Seongmin, Ha Naeun, Jeong Seo Gyeong and Lee, Young-Seak. "Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching" Carbon Letters 34, no.2 (2024) : 611-617.doi: 10.1007/s42823-023-00597-x
Lim Chaehun; Ha Seongmin; Ha Naeun; Jeong Seo Gyeong; Lee, Young-Seak. Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching. Carbon Letters, 34(2), 611-617. doi: 10.1007/s42823-023-00597-x
Lim Chaehun; Ha Seongmin; Ha Naeun; Jeong Seo Gyeong; Lee, Young-Seak. Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching. Carbon Letters. 2024; 34(2) 611-617. doi: 10.1007/s42823-023-00597-x
Lim Chaehun, Ha Seongmin, Ha Naeun, Jeong Seo Gyeong, Lee, Young-Seak. Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching. 2024; 34(2), 611-617. Available from: doi:10.1007/s42823-023-00597-x
Lim Chaehun, Ha Seongmin, Ha Naeun, Jeong Seo Gyeong and Lee, Young-Seak. "Plasma treatment of CFX: the effect of surface chemical modification coupled with surface etching" Carbon Letters 34, no.2 (2024) : 611-617.doi: 10.1007/s42823-023-00597-x
