@article{ART000906643},
author={JunHoLee and HeeSubShin and YooTaekKim and ChinHoPark},
title={Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2002},
volume={12},
number={2},
pages={101-109}
TY - JOUR
AU - JunHoLee
AU - HeeSubShin
AU - YooTaekKim
AU - ChinHoPark
TI - Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2002
VL - 12
IS - 2
PB - The Korea Association Of Crystal Growth, Inc.
SP - 101
EP - 109
SN - 1225-1429
AB -
KW -
DO -
UR -
ER -
JunHoLee, HeeSubShin, YooTaekKim and ChinHoPark. (2002). Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique. Journal of the Korean Crystal Growth and Crystal Technology, 12(2), 101-109.
JunHoLee, HeeSubShin, YooTaekKim and ChinHoPark. 2002, "Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique", Journal of the Korean Crystal Growth and Crystal Technology, vol.12, no.2 pp.101-109.
JunHoLee, HeeSubShin, YooTaekKim, ChinHoPark "Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique" Journal of the Korean Crystal Growth and Crystal Technology 12.2 pp.101-109 (2002) : 101.
JunHoLee, HeeSubShin, YooTaekKim, ChinHoPark. Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique. 2002; 12(2), 101-109.
JunHoLee, HeeSubShin, YooTaekKim and ChinHoPark. "Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique" Journal of the Korean Crystal Growth and Crystal Technology 12, no.2 (2002) : 101-109.
JunHoLee; HeeSubShin; YooTaekKim; ChinHoPark. Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique. Journal of the Korean Crystal Growth and Crystal Technology, 12(2), 101-109.
JunHoLee; HeeSubShin; YooTaekKim; ChinHoPark. Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique. Journal of the Korean Crystal Growth and Crystal Technology. 2002; 12(2) 101-109.
JunHoLee, HeeSubShin, YooTaekKim, ChinHoPark. Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique. 2002; 12(2), 101-109.
JunHoLee, HeeSubShin, YooTaekKim and ChinHoPark. "Thermodynamic analysis of the deposition process of SiC/C functionally gradient materials by CVD technique" Journal of the Korean Crystal Growth and Crystal Technology 12, no.2 (2002) : 101-109.
