Characterization of colloid/interface properties between clay and EAF dust (점토와 전기로 제강분진의 콜로이드/계면 특성 분석)

Ji-Young Lee (이지영); Yooteak Kim (김유택); Ki-Gang Lee (이기강); KANG SEUNG GU (강승구); Jung-Hwan Kim (김정환)

Characterization of colloid/interface properties between clay and EAF dust

Journal of the Korean Crystal Growth and Crystal Technology
Abbr : J. Korean Cryst. Growth Cryst. Technol.
2006, 16(2), pp.76-81
Publisher : The Korea Association Of Crystal Growth, Inc.
Research Area : Engineering > Materials Science and Engineering

Ji-Young Lee ¹, Yooteak Kim ¹, Ki-Gang Lee ¹, KANG SEUNG GU ¹, Jung-Hwan Kim ¹

¹경기대학교

Accredited

ABSTRACT

The leaching behavior of heavy metal ions with pH and colloid/interface property was analyzed by ICP andSEM. The heavy metals in EAF dust are ‘amphoteric metal’ and the heavy metal ions leached a litle at pH 10. And theleaching concentrations of heavy metals at pH 12 were higher than the that at pH 8. The leaching concentrations of heavywere effectively decreased at pH 12. The observation of colloid/interface properties shows that the soluble silicon hydroxidefrom clay at pH 12 was precipitated at the surface of the heavy metal and clay particles. This silicon hydroxideprecipitates were named the PSHP. The leaching concentrations of heavy metal ion were effectively decreased by theformation of PSHP when adding the clay to the EAF dust and controlling the pH of the slurry at 12.Key words Colloid/interface property, Heavy metal, Sedimentation height, PSHP

KEYWORDS

Colloid/interface property, Heavy metal, Sedimentation height, PSHP??

Citation status

* References for papers published after 2023 are currently being built.

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Journal of the Korean Crystal Growth and Crystal Technology 2023 KCI Impact Factor : 0.19