@article{ART001076771},
author={송명근 and YOON, DAEHO and Yo-Seung Song and Lee Han Young and Woo Seok Yang and 권순우 and 이형만 and 김우경},
title={Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2007},
volume={17},
number={4},
pages={145-150}
TY - JOUR
AU - 송명근
AU - YOON, DAEHO
AU - Yo-Seung Song
AU - Lee Han Young
AU - Woo Seok Yang
AU - 권순우
AU - 이형만
AU - 김우경
TI - Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2007
VL - 17
IS - 4
PB - The Korea Association Of Crystal Growth, Inc.
SP - 145
EP - 150
SN - 1225-1429
AB - The SiO2 and TiO2 thin films for the multilayer interference filter application were manufactured by electron beam process. In case of electron beam process with ion source, the anode current was controlled by gas volume ratio of
O2 and Ar. Substrate temperature of electron beam deposition without ion source was increased from 100 to 250oC with 50oC increment. The surface roughness values of SiO2 thin films was most low value at 200
oC substrate temperature and
0.2 A anode current respectively. And the surface roughness values of TiO2 thin films was most low value at room temperature and 0.2 A anode current repectively. The refractive index of SiO2 and TiO2 thin films to be deposited with ion source was usually lower than that of thin films without ion source.
KW - e-Beam;Ion beam assisted deposition
DO -
UR -
ER -
송명근, YOON, DAEHO, Yo-Seung Song, Lee Han Young, Woo Seok Yang, 권순우, 이형만 and 김우경. (2007). Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source. Journal of the Korean Crystal Growth and Crystal Technology, 17(4), 145-150.
송명근, YOON, DAEHO, Yo-Seung Song, Lee Han Young, Woo Seok Yang, 권순우, 이형만 and 김우경. 2007, "Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source", Journal of the Korean Crystal Growth and Crystal Technology, vol.17, no.4 pp.145-150.
송명근, YOON, DAEHO, Yo-Seung Song, Lee Han Young, Woo Seok Yang, 권순우, 이형만, 김우경 "Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source" Journal of the Korean Crystal Growth and Crystal Technology 17.4 pp.145-150 (2007) : 145.
송명근, YOON, DAEHO, Yo-Seung Song, Lee Han Young, Woo Seok Yang, 권순우, 이형만, 김우경. Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source. 2007; 17(4), 145-150.
송명근, YOON, DAEHO, Yo-Seung Song, Lee Han Young, Woo Seok Yang, 권순우, 이형만 and 김우경. "Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source" Journal of the Korean Crystal Growth and Crystal Technology 17, no.4 (2007) : 145-150.
송명근; YOON, DAEHO; Yo-Seung Song; Lee Han Young; Woo Seok Yang; 권순우; 이형만; 김우경. Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source. Journal of the Korean Crystal Growth and Crystal Technology, 17(4), 145-150.
송명근; YOON, DAEHO; Yo-Seung Song; Lee Han Young; Woo Seok Yang; 권순우; 이형만; 김우경. Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source. Journal of the Korean Crystal Growth and Crystal Technology. 2007; 17(4) 145-150.
송명근, YOON, DAEHO, Yo-Seung Song, Lee Han Young, Woo Seok Yang, 권순우, 이형만, 김우경. Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source. 2007; 17(4), 145-150.
송명근, YOON, DAEHO, Yo-Seung Song, Lee Han Young, Woo Seok Yang, 권순우, 이형만 and 김우경. "Optical properties of SiO2 and TiO2 thin films deposited by electron beam process with and withoution-beam source" Journal of the Korean Crystal Growth and Crystal Technology 17, no.4 (2007) : 145-150.
