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The effect of heat treatment parameters on the emitter formation of the n-type silicon solar cell

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2008, 18(5), pp.179~183
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

심지명 1,  KIM YOUNG KWAN 1

1인천대학교

Accredited

ABSTRACT

Employing screen printing technology, aluminum is applied to the back side of the n-type silicon wafer to see the effect of the heat treatment parameters on the Voc of the solar cell. Heat treatment at 850℃ produces the highest Voc among various heat treatment conditions. Heat treatment at the temperatures higher than 850℃ results in lower Voc, which is due to the destruction of the Al-Si alloy emitter layer. The destruction of Al-Si layer observed to be caused by the vigorous movement of silicon atoms toward aluminum layer during the heat treatment.

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