Optical properties of vanadium dioxide thin films on c-Al2O3 (001) substrates by in-situ RF magnetron sputtering

Han Seung Ho (한승호); 강소희; 김형근; YOON, DAEHO (윤대호); Woo Seok Yang (양우석)

doi:10.6111/JKCGCT.2013.23.5.224

Optical properties of vanadium dioxide thin films on c-Al2O3 (001) substrates by in-situ RF magnetron sputtering

Journal of the Korean Crystal Growth and Crystal Technology
Abbr : J. Korean Cryst. Growth Cryst. Technol.
2013, 23(5), pp.224-229
DOI : 10.6111/JKCGCT.2013.23.5.224
Publisher : The Korea Association Of Crystal Growth, Inc.
Research Area : Engineering > Materials Science and Engineering

Han Seung Ho ¹, 강소희 ¹, 김형근 ¹, YOON, DAEHO ², Woo Seok Yang ¹

¹전자부품연구원
²성균관대학교

Accredited

ABSTRACT

Vanadium oxide thin films were deposited on c-Al2O3 (001) substrate by in-situ RF magnetron sputtering. Oxygen partial pressure was adjusted to prepare thermochromic VO2 phase. X-ray diffraction patterns and scanning electron microscopy convincingly showed that plate-like V2O5 grains were changed into round-shape VO2 grains as oxygen partial pressure decreased. After the optimized deposition conditions were fixed, the effect of substrate temperature and orientation on the optical properties of VO2 thin films was analyzed.

KEYWORDS

VO2, Thermochromic, Optical properties, Crystal structure, Microstructure, Thin Films

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* References for papers published after 2023 are currently being built.

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Journal of the Korean Crystal Growth and Crystal Technology 2023 KCI Impact Factor : 0.19

Optical properties of vanadium dioxide thin films on c-Al2O3 (001) substrates by in-situ RF magnetron sputtering

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* References for papers published after 2023 are currently being built.

Journal of the Korean Crystal Growth and Crystal Technology 2023 KCI Impact Factor : 0.19

Optical properties of vanadium dioxide thin films on c-Al2O3 (001) substrates by in-situ RF magnetron sputtering

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