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Selective growth of GaN nanorods on the top of GaN stripes

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2014, 24(4), pp.145-150
  • DOI : 10.6111/JKCGCT.2014.24.4.145
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

유연수 1 Jun Hyeong Lee 1 Hyung Soo Ahn 1 Keesam Shin 2 Yincheng He 2 Min Yang 1

1한국해양대학교
2창원대학교

Accredited

ABSTRACT

GaN nanorods were grown on the apex of GaN stripes by three dimensional selective growth method. SiO2mask was partially removed only on the apex area of the GaN stripes by an optimized photolithography for the selectivegrowth. Metallic Au was deposited only on the apex of the GaN stripes and a selective growth of GaN nanorods wasfollowed by a metal organic vapor phase epitaxy (MOVPE). We confirmed that the shape and size of the GaN nanorodsdepend on growth temperature and flow rates of group III precursor. GaN nanorods were grown having a taper shapewhich have sharp tip and triangle-shaped cross section. From the TEM result, we confirmed that threading dislocationswere rarely observed in GaN nanorods because of the very small contact area for the selective growth. Stacking faultswhich might be originated from a difference of the crystal facet directions between the GaN stripe and the GaN nanorodswere observed in the center area of the GaN nanorods.

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This paper was written with support from the National Research Foundation of Korea.