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Effect of processing parameters on TiO2 film by room temperature granule spray in vacuum

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2017, 27(1), pp.22-27
  • DOI : 10.6111/JKCGCT.2017.27.1.022
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : October 7, 2016
  • Accepted : December 16, 2016
  • Published : February 28, 2017

Han-Gil Kim 1 Yoon-Soo Park 1 Kook-soo Bang 1 Dong-Soo Park 2 Chan Park 1

1부경대학교
2재료연구소

Accredited

ABSTRACT

TiO2 films, thickness of 1~30 μm were deposited on glass substrate at room temperature by room temperature granule spray in vacuum. The starting powder was calcinated at 600 o C for 4 h using Al2O3 crucible in the furnace. The particle size of the TiO2, 1.5 μm was measured by a particle size analyzer. The effect of different process parameters such as number of pass, gas flow rate and feeder voltage was studied. As the number of passes increased, the film thickness increased proportionally due to adequate kinetic energy conserved. The effect of three different flow rates (i.e. 15, 25, and 35 LPM) on deposited film was investigated. As gas flow rate increased, the film thickness increased up to 25 LPM and then decreased. Higher feeder voltage with low flow rate of 15 LPM resulted in unsufficient coating thickness due to insufficient kinetic energy. Microstructure of TiO2 films was investigated by scanning electron microscope and high resolution tramission electron microscope.

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