@article{ART002217569},
author={Choi ByoungSu and Seok Hwan Choi and Jeong-ho Ryu and Cho, Hyun},
title={Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2017},
volume={27},
number={2},
pages={75-79},
doi={10.6111/JKCGCT.2017.27.2.075}
TY - JOUR
AU - Choi ByoungSu
AU - Seok Hwan Choi
AU - Jeong-ho Ryu
AU - Cho, Hyun
TI - Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2017
VL - 27
IS - 2
PB - The Korea Association Of Crystal Growth, Inc.
SP - 75
EP - 79
SN - 1225-1429
AB - Honeycomb-shaped Ag-grid transparent conductive electrodes (TCEs) were fabricated using two different processes, high density plasma etching and lift-off, and the optical and electrical properties were compared according to the fabrication method. For the fabrication of the Ag-grid TCEs by plasma etching, etch characteristics of the Ag thin film in 10CF4/5Ar inductively coupled plasma (ICP) discharges were studied. The Ag etch rate increased as the power increased at relatively low ICP source power or rf chuck power conditions, and then decreased at higher powers due to either decrease in Ar + ion energy or Ar + ion-assisted removal of the reactive F radicals. The Ag-grid TCEs fabricated by the 10CF4/5Ar ICP etching process showed better grid pattern transfer efficiency without any distortion or breakage in the grid pattern and higher optical transmittance values of average 83.3 % (pixel size 30 μm/line width 5 μm) and 71 % (pixel size 26 μm/line width 8 μm) in the visible range of spectrum, respectively. On the other hand, the Ag-grid TCEs fabricated by the lift-off process showed lower sheet resistance values of 2.163 Ω/□ (pixel size 26 μm/line width 8 μm) and 4.932 Ω/□ (pixel size 30 μm/line width 5 μm), respectively.
KW - Ag-grid transparent conductive electrodes;High density plasma etching;Lift-off;Optical transmittance;Sheet resistance
DO - 10.6111/JKCGCT.2017.27.2.075
ER -
Choi ByoungSu, Seok Hwan Choi, Jeong-ho Ryu and Cho, Hyun. (2017). Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method. Journal of the Korean Crystal Growth and Crystal Technology, 27(2), 75-79.
Choi ByoungSu, Seok Hwan Choi, Jeong-ho Ryu and Cho, Hyun. 2017, "Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method", Journal of the Korean Crystal Growth and Crystal Technology, vol.27, no.2 pp.75-79. Available from: doi:10.6111/JKCGCT.2017.27.2.075
Choi ByoungSu, Seok Hwan Choi, Jeong-ho Ryu, Cho, Hyun "Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method" Journal of the Korean Crystal Growth and Crystal Technology 27.2 pp.75-79 (2017) : 75.
Choi ByoungSu, Seok Hwan Choi, Jeong-ho Ryu, Cho, Hyun. Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method. 2017; 27(2), 75-79. Available from: doi:10.6111/JKCGCT.2017.27.2.075
Choi ByoungSu, Seok Hwan Choi, Jeong-ho Ryu and Cho, Hyun. "Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method" Journal of the Korean Crystal Growth and Crystal Technology 27, no.2 (2017) : 75-79.doi: 10.6111/JKCGCT.2017.27.2.075
Choi ByoungSu; Seok Hwan Choi; Jeong-ho Ryu; Cho, Hyun. Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method. Journal of the Korean Crystal Growth and Crystal Technology, 27(2), 75-79. doi: 10.6111/JKCGCT.2017.27.2.075
Choi ByoungSu; Seok Hwan Choi; Jeong-ho Ryu; Cho, Hyun. Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method. Journal of the Korean Crystal Growth and Crystal Technology. 2017; 27(2) 75-79. doi: 10.6111/JKCGCT.2017.27.2.075
Choi ByoungSu, Seok Hwan Choi, Jeong-ho Ryu, Cho, Hyun. Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method. 2017; 27(2), 75-79. Available from: doi:10.6111/JKCGCT.2017.27.2.075
Choi ByoungSu, Seok Hwan Choi, Jeong-ho Ryu and Cho, Hyun. "Comparison of characteristics of silver-grid transparent conductive electrodes for display devices according to fabrication method" Journal of the Korean Crystal Growth and Crystal Technology 27, no.2 (2017) : 75-79.doi: 10.6111/JKCGCT.2017.27.2.075
