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Numerical simulation optimization for solution growth of silicon carbide

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2017, 27(3), pp.130-134
  • DOI : 10.6111/JKCGCT.2017.27.3.130
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : April 21, 2017
  • Accepted : June 7, 2017
  • Published : June 30, 2017

Young-Gon Kim 1 Su-Hun Choi 1 Chae Young Lee 1 Jeong Min Choi 1 Mi-Seon Park 1 Yeon-Suk Jang 1 Seongmin Jeong ORD ID 2 Myung-Hyun Lee 2 Younghee Kim 2 Won-Seon Seo 2 Lee, Won Jae 1

1동의대학교
2한국세라믹기술원

Accredited

ABSTRACT

In this study, numerical simulation was performed to focus on optimized process condition for obtaining a longterm growth and high quality SiC crystal. It could be optimized by considering the change of fluid and a carbon flow in the Si melt added with 40 % Cr. The Crystal Growth Simulator (CGSim TM , STR Group Ltd.) was used as a numerical simulation. It was confirmed that many parameters such as temperature, rotation speed of seed crystal and crucible, and seed position during the crystal growth step had a strong influence on the speed and direction of solution flow for uniform temperature gradient and stable crystal growth. The optimized process condition for the solution growth of SiC crystal was successfully exhibited by adjusting various process parameters in the numerical simulation, which would be helpful for real crystal growth.

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