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The study of evaluating surface characteristics and effect of thermal annealing process for AlN single crystal grown by PVT method

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2017, 27(3), pp.143-147
  • DOI : 10.6111/JKCGCT.2017.27.3.143
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : June 12, 2017
  • Accepted : June 22, 2017
  • Published : June 30, 2017

Hyo Sang Kang 1 Suk Hyun Kang 1 Cheol Woo Park 1 Jae Hwa Park 1 Hyun-Mi Kim 1 Jung Hun Lee 1 Hee Ae Lee 1 Joo Hyung Lee 1 Kang, Seung-Min 2 Kwang Bo Shim 1

1한양대학교
2한서대학교

Accredited

ABSTRACT

To evaluate surface characteristics and improve crystalline quality of AlN single crystal grown by physical vapor transport (PVT) method, wet chemical etching process using KOH/H2O2 mixture in a low temperature condition and thermal annealing process was proceeded respectively. Conventional etching process using strong base etchant at a high temperature (above 300 o C) had formed over etching phenomenon according to crystalline quality of materials. When it occurred to over etching phenomenon, it had a low reliability of dislocation density because it cannot show correct number of etch pits per estimated area. Therefore, it was proceeded to etching process in a low temperature (below 100 o C) using H2O2 as an oxidizer in KOH aqueous solution and to be determined optimum etching condition and dislocation density via scanning electron microscope (SEM). For improving crystalline quality of AlN single crystal, thermal annealing process was proceeded. When compared with specimens as-prepared and as-annealed, full width at half maximum (FWHM) of the specimen as-annealed was decreased exponentially, and we analyzed the mechanism of this process via double crystal X-ray diffraction (DC-XRD).

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