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Influence of relative distance between heater and quartz crucible on temperature profile of hot-zone in Czochralski silicon crystal growth

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2018, 28(5), pp.179-184
  • DOI : 10.6111/JKCGCT.2018.28.5.179
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : September 20, 2018
  • Accepted : October 12, 2018
  • Published : October 31, 2018

Kwanghun Kim 1 Sejin Kwon 1 Ilhwan Kim 2 Junseong Park 2 Taehun Shim 2 Jeagun Park 2

1웅진에너지 연구소
2한양대학교

Accredited

ABSTRACT

To lessen oxygen concentrations in a wafer through modifying the length of graphite heaters, we investigated the influence of relative distance from heater to quartz crucible on temperature profile of hot-zone in Czochralski siliconcrystal growth by simulation. In particular, ATC temperature and power profiles as a function of different ingot body positions were investigated for five different heater designs; (a) typical side heater (SH), (b) short side heater-up (SSH-up), (c) short side heater-low (SSH-low), (d) bottom heater without side heater (Only-BH), and (e) side heater with bottom heater (SH + BH). It was confirmed that lower short side heater exhibited the highest ATC temperature, which was attributed to the longest distance from triple point to heater center. In addition, for the viewpoint of energy efficiency, it was observed that the typical side heater showed the lowest power because it heated more area of quartz crucible than that of others. This result provides the possibility to predict the feed-forward delta temperature profile as a function of various heater designs.

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