KJCKorea
Journal Central

@article{ART002475723},
author={Geug Tae Kim},
title={Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2019},
volume={29},
number={3},
pages={123-131},
doi={10.6111/JKCGCT.2019.29.3.123}

TY - JOUR
AU - Geug Tae Kim
TI - Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2019
VL - 29
IS - 3
PB - The Korea Association Of Crystal Growth, Inc.
SP - 123
EP - 131
SN - 1225-1429
AB - In this study, the development of transparent UV blocking material using TiO2−x oxide thin film process wasdeveloped. A process technology is related to a process technology for making a sample with ultraviolet-shielding propertyof visible light transmittance of 78 % or more (total light transmittance at 550 nm) and of a UV cut-off characteristic ofmore than 95 % at 315 nm in ultraviolet wavelength band. In this study, it is possible to establish a flexible device processcondition of high performance ultraviolet (UV) shielding thin film, to design mixed type of transparent flexible device withheterogeneous characteristics and to formulate composite deposition technology, according to various market demands. Establishment of actual roll-to-roll continuous process and equipment and process technology will affect related industriesgreatly.
KW - TiO2−x;UV blocking material;Plasma process
DO - 10.6111/JKCGCT.2019.29.3.123
ER -

Geug Tae Kim. (2019). Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process. Journal of the Korean Crystal Growth and Crystal Technology, 29(3), 123-131.

Geug Tae Kim. 2019, "Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process", Journal of the Korean Crystal Growth and Crystal Technology, vol.29, no.3 pp.123-131. Available from: doi:10.6111/JKCGCT.2019.29.3.123

Geug Tae Kim "Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process" Journal of the Korean Crystal Growth and Crystal Technology 29.3 pp.123-131 (2019) : 123.

Geug Tae Kim. Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process. 2019; 29(3), 123-131. Available from: doi:10.6111/JKCGCT.2019.29.3.123

Geug Tae Kim. "Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process" Journal of the Korean Crystal Growth and Crystal Technology 29, no.3 (2019) : 123-131.doi: 10.6111/JKCGCT.2019.29.3.123

Geug Tae Kim. Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process. Journal of the Korean Crystal Growth and Crystal Technology, 29(3), 123-131. doi: 10.6111/JKCGCT.2019.29.3.123

Geug Tae Kim. Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process. Journal of the Korean Crystal Growth and Crystal Technology. 2019; 29(3) 123-131. doi: 10.6111/JKCGCT.2019.29.3.123

Geug Tae Kim. Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process. 2019; 29(3), 123-131. Available from: doi:10.6111/JKCGCT.2019.29.3.123

Geug Tae Kim. "Development of harmful ultraviolet blocking transparent flexible device using TiO2−x thin film process" Journal of the Korean Crystal Growth and Crystal Technology 29, no.3 (2019) : 123-131.doi: 10.6111/JKCGCT.2019.29.3.123