@article{ART002580686},
author={Hyein Na and Jewon Park and Jae-hyuk Park and Dae-gun Kim and Sungchurl Choi and Kim Hyeong Jun},
title={Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2020},
volume={30},
number={2},
pages={66-72},
doi={10.6111/JKCGCT.2020.30.2.066}
TY - JOUR
AU - Hyein Na
AU - Jewon Park
AU - Jae-hyuk Park
AU - Dae-gun Kim
AU - Sungchurl Choi
AU - Kim Hyeong Jun
TI - Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2020
VL - 30
IS - 2
PB - The Korea Association Of Crystal Growth, Inc.
SP - 66
EP - 72
SN - 1225-1429
AB - The difference of plasma resistance between the CAS glass bulk and coating films were compared. Plasmaresistance was confirmed by analyzing the etch rate and the microstructure of the surface when the CAS glass bulk andthe glass coating film were etched with CF4/O2/Ar plasma gas. CAS glass coating film was etched up to 25 times fasterthan the glass bulk. A statistically high correlation between the surface roughness and the etching rate of the coating filmwas derived, and thus, the high surface roughness of the coating film was determined to cause rapid etching. In addition,cristobalite crystals that has a low Ca content and a high Si content, was foamed on the glass coating film. Therefore, theCAS glass coating film is considered to have low plasma resistance compared to the glass bulk.
KW - Corrosion;Sintering;CaO-Al2O3-SiO2 (CAS) glass;Surface roughness
DO - 10.6111/JKCGCT.2020.30.2.066
ER -
Hyein Na, Jewon Park, Jae-hyuk Park, Dae-gun Kim, Sungchurl Choi and Kim Hyeong Jun. (2020). Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching. Journal of the Korean Crystal Growth and Crystal Technology, 30(2), 66-72.
Hyein Na, Jewon Park, Jae-hyuk Park, Dae-gun Kim, Sungchurl Choi and Kim Hyeong Jun. 2020, "Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching", Journal of the Korean Crystal Growth and Crystal Technology, vol.30, no.2 pp.66-72. Available from: doi:10.6111/JKCGCT.2020.30.2.066
Hyein Na, Jewon Park, Jae-hyuk Park, Dae-gun Kim, Sungchurl Choi, Kim Hyeong Jun "Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching" Journal of the Korean Crystal Growth and Crystal Technology 30.2 pp.66-72 (2020) : 66.
Hyein Na, Jewon Park, Jae-hyuk Park, Dae-gun Kim, Sungchurl Choi, Kim Hyeong Jun. Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching. 2020; 30(2), 66-72. Available from: doi:10.6111/JKCGCT.2020.30.2.066
Hyein Na, Jewon Park, Jae-hyuk Park, Dae-gun Kim, Sungchurl Choi and Kim Hyeong Jun. "Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching" Journal of the Korean Crystal Growth and Crystal Technology 30, no.2 (2020) : 66-72.doi: 10.6111/JKCGCT.2020.30.2.066
Hyein Na; Jewon Park; Jae-hyuk Park; Dae-gun Kim; Sungchurl Choi; Kim Hyeong Jun. Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching. Journal of the Korean Crystal Growth and Crystal Technology, 30(2), 66-72. doi: 10.6111/JKCGCT.2020.30.2.066
Hyein Na; Jewon Park; Jae-hyuk Park; Dae-gun Kim; Sungchurl Choi; Kim Hyeong Jun. Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching. Journal of the Korean Crystal Growth and Crystal Technology. 2020; 30(2) 66-72. doi: 10.6111/JKCGCT.2020.30.2.066
Hyein Na, Jewon Park, Jae-hyuk Park, Dae-gun Kim, Sungchurl Choi, Kim Hyeong Jun. Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching. 2020; 30(2), 66-72. Available from: doi:10.6111/JKCGCT.2020.30.2.066
Hyein Na, Jewon Park, Jae-hyuk Park, Dae-gun Kim, Sungchurl Choi and Kim Hyeong Jun. "Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching" Journal of the Korean Crystal Growth and Crystal Technology 30, no.2 (2020) : 66-72.doi: 10.6111/JKCGCT.2020.30.2.066