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Growth of ring-shaped SiC single crystal via physical vapor transport method

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2022, 32(1), pp.1-6
  • DOI : 10.6111/JKCGCT.2022.32.1.001
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : January 22, 2022
  • Accepted : February 7, 2022
  • Published : February 28, 2022

Woo-Yeon Kim 1 Tae-Wan Je 1 Jun-Hyuck Na 1 Su-Min Choi 1 Ha-Lin Lee 1 Hui-Yeon Jang 1 Mi-Seon Park 1 Yeon-Suk Jang 1 Yeon-Suk Jang 2 Jin-Ki Kang 3 Lee, Won Jae 1

1동의대학교
2(주)KXT
3(주)악셀

Accredited

ABSTRACT

In this research, a ring-shaped silicon carbide (SiC) single crystal manufactured using the PVT (Physical VaporTransport) method was proposed to be applied to a SiC focus ring in semiconductor etching equipment. A cylindricalgraphite structure was placed inside the graphite crucible to grow a ring-shaped SiC single crystal by the PVT method. SiCsingle crystal ring without crack was successfully obtained in case of using SiC single crystal wafer as a seed. A plasmaetching process was performed to compare plasma resistance between the CVD-SiC focus ring and the PVT-SiC focus ring. The etch rate of ring materials in PVT-single crystal SiC focus ring was definitely lower than that of CVD-SiC focus ring,indicating better plasma resistance of PVT-SiC focus ring.

Citation status

* References for papers published after 2023 are currently being built.