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The effect of PVT process parameters on the resistance of HPSI-SiC crystal

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2024, 34(2), pp.41-47
  • DOI : 10.6111/JKCGCT.2024.34.2.041
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : February 6, 2024
  • Accepted : March 14, 2024
  • Published : April 30, 2024

Jun-Hyuck Na 1 Min-Gyu Kang 1 Gi-Uk Lee 1 Ye-Jin Choi 1 Mi-Seon Park 1 Gwang-Hee Jung 1 Gyu-Do Lee 2 Woo-Yeon Kim 2 Lee, Won Jae 1

1동의대학교
2KC 인더스트리얼

Accredited

ABSTRACT

In this study, the resistance characteristics of semi-insulating SiC single crystals grown using the PVT method were investigated, considering the purity level of SiC source powders used in PVT growth and the cooling procedure after crystal growth. Two β-SiC powders with different purities were employed, and the cooling rate after growth was adjusted to achieve various resistance values. 4-inch HPSI-SiC ingots were grown using the PVT method, utilizing SiC powderswith low nitrogen concentration and relatively high nitrogen concentration. These ingots were then subjected to different cooling procedures to modify the cooling rate. Transmission/absorption spectra and crystal quality of the grown crystals were analyzed through UV/VIs/NIR spectroscopy and X-ray rocking curve analysis, respectively. Additionally, electrical properties were investigated through non-contact resistivity analysis to identify the dominant factors influencing resistivity properties.

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