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The semiconductor carbon nanotube growth with atmosphere pressure chemical vapor deposition method and oxidation effect at 300oC in air

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2005, 15(2), pp.57-60
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

Jwayeon Kim 1

1호서대학교

Accredited

ABSTRACT

Semiconductor carbon nanotube was grown on oxided silicon wafer with atmosphere pressure chemical vapor deposition (APCVD) method and investigated the electrical property after thermal oxidation at 300oC in air. The electrical property was measured at room temperature in air after thermal oxidation at 300oC for various times in air. Semiconductor carbon nanotube was steadily changed to metallic carbon nanotube as increasing of thermal oxidation times at 300oC in air. Some removed area of carbon nanotube surface was shown with transmission electron microscopy (TEM) after thermal oxidation for 6 hours at 300oC in air.

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