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Growth and effect of thermal annealing for AgGaSe2 single crystal thin film by not wall epitaxy

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2006, 16(5), pp.189-197
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

Baek,Seung-Nam 1 Kwang Joon Hong 1 김장복 1

1조선대학교

Accredited

ABSTRACT

A stoichiometric mixture of evaporating materials for AgGaSe2 single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, AgGaSe2 mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were 630oC and 420oC, respectively. The temperature dependence of the energy band gap of the AgGaSe2 obtained from the absorption spectra was well described by the Varshni뭩 relation, Eg(T) = 1.9501 eV - (8.79 ?10-4 eV/K)T2/(T + 250 K). After the as-grown AgGaSe2 single crystal thin films was annealed in Ag-, Se-, and Ga-atmospheres, the origin of point defects of AgGaSe2 single crystal thin films has been investigated by the photoluminescence (PL) at 10 K. The native defects of VAg, VSe, Agint, and Seint obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Ag-atmosphere converted AgGaSe2 single crystal thin films to an optical p-type. Also, we confirmed that Ga in AgGaSe2/GaAs did not form the native defects because Ga in AgGaSe2 single crystal thin films existed in the form of stable bonds.

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