본문 바로가기
  • Home

Simulation by heat transfer of ADS process for large sized polycrystalline silicon ingot growth

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2008, 18(1), pp.45-49
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

서중원 1 Sang-Jin Moon 2 Jung-Hoon Hwang 1 KIM, YOUN-JEA 1 WonWook So 2 YOON, DAEHO 1

1성균관대학교
2한국화학연구원

Accredited

ABSTRACT

The development of manufacturing process of silicon (Si) ingots is one of the important issues to the growth of the photovoltaic industry. Polycrystalline Si wafers shares more than 60 % of the photovoltaic market due to its cost advantage compared to monocrystalline silicon wafers. Several solidification processes have been developed by industry including casting, heat exchange method (HEM) and electromagnetic casting. In this paper, the advanced directional solidification (ADS) method is used to growth of large sized polycrystalline Si ingot. This method has the advantages of the small heat loss, short cycle time and efficient directional solidification. The numerical simulation of the process is applied using a fluid dynamics model to simulate the temperature distribution. The results of simulations are confirmed efficient directional solidification to the growth of large sized polycrystalline Si ingot above 240 kg.

Citation status

* References for papers published after 2023 are currently being built.