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Growth of semi-polar (1-101) InGaN/GaN MQW structures on 8o off -axis (100) patterned Si substrate by MOVPE

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2009, 19(1), pp.1-5
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

한영훈 1 Hunsoo Jeon 1 홍상현 1 Eunju Kim 1 이아름 1 Kyoung Hwa Kim 1 Hyung Soo Ahn 1 Min Yang 1 T. Tanikawa 2 Y. Honda 2 M. Yamaguchi 2 N. Sawaki 2

1한국해양대학교
2나고야대학

Accredited

ABSTRACT

In this study, we performed growth of InGaN/GaN multi quantum well (MQW) structures on semi-polar (1-101) GaN facet on 8-degree off oriented stripe patterned (100) Si substrates by MOVPE. The structural and optical properties of the InGaN/GaN multi quantum well (MQW) structures grown on (1-101) GaN stripe depend on NH3 flow rate, TMI flow rate and growth temperature are characterized by cathodoluminescence (CL) and scanning electron microscopy (SEM). With the decrease of NH3 flow rate, the threading dislocation of (1-101) GaN is considerably reduced. We could control the transition wavelength of InGaN/GaN MQW structures from 391.5 nm to 541.2 nm depend on the growth conditions.

Citation status

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This paper was written with support from the National Research Foundation of Korea.