@article{ART001441000},
author={김민수 and Hyun Joo Lee and Boram Lee and 이윤석 and 이은경 and 이주동 and KIM YANGDO},
title={Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2010},
volume={20},
number={2},
pages={85-92}
TY - JOUR
AU - 김민수
AU - Hyun Joo Lee
AU - Boram Lee
AU - 이윤석
AU - 이은경
AU - 이주동
AU - KIM YANGDO
TI - Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2010
VL - 20
IS - 2
PB - The Korea Association Of Crystal Growth, Inc.
SP - 85
EP - 92
SN - 1225-1429
AB - SF6 gas has been widely used in many industrial fields as insulating, cleaning and covering gases due to its outstanding arc-extinguishing and insulating properties. However, global warming potential of SF6 gas is 23,900 times more than that of CO2 and it remains in the air during 3,200 years. For these reason, technological and economical effects could be expected for the separation of SF6 from gas mixtures by hydrate forming process. In this study, we carried out morphological studies for the SF6 hydrate crystal to understand its formation and growth mechanisms. SF6 hydrate film was initially formed at the interfacial boundary between gas and liquid regions, and then subsequent dendrite crystals growth was observed. The dendrite crystals grew to the direction of gas region probably due to the guest gas concentration gradient. The detailed growth characteristics of SF6 hydrate crystals such as nucleation, migration, growth and interference were discussed in this study.
KW - Hydrate;Sulfur hexafluoride;Film growth;Dendrite
DO -
UR -
ER -
김민수, Hyun Joo Lee, Boram Lee, 이윤석, 이은경, 이주동 and KIM YANGDO. (2010). Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface. Journal of the Korean Crystal Growth and Crystal Technology, 20(2), 85-92.
김민수, Hyun Joo Lee, Boram Lee, 이윤석, 이은경, 이주동 and KIM YANGDO. 2010, "Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface", Journal of the Korean Crystal Growth and Crystal Technology, vol.20, no.2 pp.85-92.
김민수, Hyun Joo Lee, Boram Lee, 이윤석, 이은경, 이주동, KIM YANGDO "Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface" Journal of the Korean Crystal Growth and Crystal Technology 20.2 pp.85-92 (2010) : 85.
김민수, Hyun Joo Lee, Boram Lee, 이윤석, 이은경, 이주동, KIM YANGDO. Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface. 2010; 20(2), 85-92.
김민수, Hyun Joo Lee, Boram Lee, 이윤석, 이은경, 이주동 and KIM YANGDO. "Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface" Journal of the Korean Crystal Growth and Crystal Technology 20, no.2 (2010) : 85-92.
김민수; Hyun Joo Lee; Boram Lee; 이윤석; 이은경; 이주동; KIM YANGDO. Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface. Journal of the Korean Crystal Growth and Crystal Technology, 20(2), 85-92.
김민수; Hyun Joo Lee; Boram Lee; 이윤석; 이은경; 이주동; KIM YANGDO. Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface. Journal of the Korean Crystal Growth and Crystal Technology. 2010; 20(2) 85-92.
김민수, Hyun Joo Lee, Boram Lee, 이윤석, 이은경, 이주동, KIM YANGDO. Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface. 2010; 20(2), 85-92.
김민수, Hyun Joo Lee, Boram Lee, 이윤석, 이은경, 이주동 and KIM YANGDO. "Characteristics of sulfur hexafluoride hydrate film growth at the vapor/liquid interface" Journal of the Korean Crystal Growth and Crystal Technology 20, no.2 (2010) : 85-92.
