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New fabrication of CIGS crystals growth by a HVT method

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2010, 20(3), pp.107-112
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

GANG SEOK LEE 1 Hunsoo Jeon 1 이아름 1 Se-Gyo Jung 1 Seon Min Bae 1 조동완 1 옥진은 1 Kyoung Hwa Kim 1 Min Yang 1 이삼녕 ORD ID 1 Hyung Soo Ahn 1 Jong Seong Bae 2 Hong Ju Ha 3

1한국해양대학교
2한국기초과학지원연구원
3시스솔루션

Accredited

ABSTRACT

The Cu(In1 − xGax)Se2 is the absorber material for thin film solar cell with high absorption coefficient of 1 × 105cm−1. In the case of CIGS, the movable energy band gap from CuInSe2 (1.00 eV) to CuGaSe2 (1.68 eV) can be acquired while controlling Ga contain ratio. Generally, the co-evaporator method have used for development and fabrication of the CIGS absorption layer. However, this method should need many steps and lengthy deposition time with high temperature. For these reasons, in this paper, a new growth method of CIGS layer was attempted to hydride vapor transport (HVT)method. The CIGS mixed-source material reacted for HCl gas in the source zone was deposited on the substrate after transporting to growth zone. c-plane Al2O3 and undoped GaN were used as substrates for growth. The characteristics of grown samples were measured from SEM and EDS.

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