@article{ART001546995},
author={Park Ju-Hoon and 김봉수 and 김병훈},
title={Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2011},
volume={21},
number={2},
pages={65-69}
TY - JOUR
AU - Park Ju-Hoon
AU - 김봉수
AU - 김병훈
TI - Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2011
VL - 21
IS - 2
PB - The Korea Association Of Crystal Growth, Inc.
SP - 65
EP - 69
SN - 1225-1429
AB - The TiO2 films were prepared on glass, silicon and quartz substrate at different temperature by radio frequency reactive magnetron sputtering under different flow ratios of Ar and O2 gases. The films were characterized by X-ray diffractometer (XRD), scanning electron microscope (SEM), atomic force microscope (AFM) and UV-VIS spectrophotometer.
Only the anatase phase was observed in films and their diffaction peaks increased with temprature of substrate. The size of crystallites decreased with higher concentration of oxygen. Refractive index and optical absorption of thin films decreased with higher concentration of oxygen. The thin films which have good transmittance spectra and smooth surface, deposited in the sputtering ambient with 10 % of O2 at the temperature from 300oC to 400oC.
KW - TiO2;RF magnetron sputtering;Working gas ratio
DO -
UR -
ER -
Park Ju-Hoon, 김봉수 and 김병훈. (2011). Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering. Journal of the Korean Crystal Growth and Crystal Technology, 21(2), 65-69.
Park Ju-Hoon, 김봉수 and 김병훈. 2011, "Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering", Journal of the Korean Crystal Growth and Crystal Technology, vol.21, no.2 pp.65-69.
Park Ju-Hoon, 김봉수, 김병훈 "Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering" Journal of the Korean Crystal Growth and Crystal Technology 21.2 pp.65-69 (2011) : 65.
Park Ju-Hoon, 김봉수, 김병훈. Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering. 2011; 21(2), 65-69.
Park Ju-Hoon, 김봉수 and 김병훈. "Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering" Journal of the Korean Crystal Growth and Crystal Technology 21, no.2 (2011) : 65-69.
Park Ju-Hoon; 김봉수; 김병훈. Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering. Journal of the Korean Crystal Growth and Crystal Technology, 21(2), 65-69.
Park Ju-Hoon; 김봉수; 김병훈. Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering. Journal of the Korean Crystal Growth and Crystal Technology. 2011; 21(2) 65-69.
Park Ju-Hoon, 김봉수, 김병훈. Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering. 2011; 21(2), 65-69.
Park Ju-Hoon, 김봉수 and 김병훈. "Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering" Journal of the Korean Crystal Growth and Crystal Technology 21, no.2 (2011) : 65-69.
