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The properties of AlGaN epi layer grown by HVPE

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2012, 22(1), pp.11-14
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : October 14, 2011
  • Accepted : December 30, 2011

Se-Gyo Jung 1 Hunsoo Jeon 1 Gang Seok Lee 1 Seon Min Bae 1 Wi Il Yun 1 Kyoung Hwa Kim 1 Sam Nyung Yi ORD ID 1 Min Yang 1 Hyung Soo Ahn 1 Suck-Whan Kim 2 Young-Moon Yu 3 Seong Hak Cheon 4 Hong Ju Ha 4

1한국해양대학교
2안동대학교
3부경대학교
4시스솔루션

Accredited

ABSTRACT

The AlGaN layer has direct wide bandgaps ranging from 3.4 to 6.2 eV. Nowadays, it is becoming more important to fabricate optical devices in an UV region for the many applications. The high quality AlGaN layer is necessary to establish the UV optical devices. However, the growth of AlGaN layer on GaN layer is difficult due to the lattice mismatch and difference thermal expansion coefficient between GaN layer and AlGaN layer. In this paper, we attempted to grow the LED structure on GaN template by mixed-source HVPE method with multi-sliding boat system. We tried to find the optical and lattice transition of active layer by control the Al content in mixed-source. For the growth of epi layer, the HCl and NH3 gas were flowed over the mixed-source and the carrier gas was N2. The temperature of source zone and growth zone was stabled at 900 and 1090oC, respectively. After the growth, we performed the x-ray diffraction (XRD) and electro luminescence (EL) measurement.

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