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@article{ART001763076},
author={Park, Jong cheon and 정옥근 and Sang Yoon Kim and 박세진 and Young-Hoon Yun and Hyun Cho},
title={Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2013},
volume={23},
number={2},
pages={86-92},
doi={10.6111/JKCGCT.2013.23.2.86}

TY - JOUR
AU - Park, Jong cheon
AU - 정옥근
AU - Sang Yoon Kim
AU - 박세진
AU - Young-Hoon Yun
AU - Hyun Cho
TI - Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2013
VL - 23
IS - 2
PB - The Korea Association Of Crystal Growth, Inc.
SP - 86
EP - 92
SN - 1225-1429
AB - SF6/O2 inductively coupled plasmas were employed to texture Si surface as a pretreatment for nanocrystalline diamond film growth. It was found that the SF6/O2 plasma texturing provided a very wide process window where normalized roughness values in the range of 2~16 could be obtained. Significantly improved nucleation densities of ~6.5 × 1010 cm−2compared to conventional mechanical abrasion were achieved after seeding for the textured Si substrate.
KW - Nanocrystalline diamond seeding;Si surface texturing;Fluorine-based plasma;Surface roughness;Nucleation density
DO - 10.6111/JKCGCT.2013.23.2.86
ER -

Park, Jong cheon, 정옥근, Sang Yoon Kim, 박세진, Young-Hoon Yun and Hyun Cho. (2013). Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency. Journal of the Korean Crystal Growth and Crystal Technology, 23(2), 86-92.

Park, Jong cheon, 정옥근, Sang Yoon Kim, 박세진, Young-Hoon Yun and Hyun Cho. 2013, "Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency", Journal of the Korean Crystal Growth and Crystal Technology, vol.23, no.2 pp.86-92. Available from: doi:10.6111/JKCGCT.2013.23.2.86

Park, Jong cheon, 정옥근, Sang Yoon Kim, 박세진, Young-Hoon Yun, Hyun Cho "Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency" Journal of the Korean Crystal Growth and Crystal Technology 23.2 pp.86-92 (2013) : 86.

Park, Jong cheon, 정옥근, Sang Yoon Kim, 박세진, Young-Hoon Yun, Hyun Cho. Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency. 2013; 23(2), 86-92. Available from: doi:10.6111/JKCGCT.2013.23.2.86

Park, Jong cheon, 정옥근, Sang Yoon Kim, 박세진, Young-Hoon Yun and Hyun Cho. "Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency" Journal of the Korean Crystal Growth and Crystal Technology 23, no.2 (2013) : 86-92.doi: 10.6111/JKCGCT.2013.23.2.86

Park, Jong cheon; 정옥근; Sang Yoon Kim; 박세진; Young-Hoon Yun; Hyun Cho. Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency. Journal of the Korean Crystal Growth and Crystal Technology, 23(2), 86-92. doi: 10.6111/JKCGCT.2013.23.2.86

Park, Jong cheon; 정옥근; Sang Yoon Kim; 박세진; Young-Hoon Yun; Hyun Cho. Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency. Journal of the Korean Crystal Growth and Crystal Technology. 2013; 23(2) 86-92. doi: 10.6111/JKCGCT.2013.23.2.86

Park, Jong cheon, 정옥근, Sang Yoon Kim, 박세진, Young-Hoon Yun, Hyun Cho. Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency. 2013; 23(2), 86-92. Available from: doi:10.6111/JKCGCT.2013.23.2.86

Park, Jong cheon, 정옥근, Sang Yoon Kim, 박세진, Young-Hoon Yun and Hyun Cho. "Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency" Journal of the Korean Crystal Growth and Crystal Technology 23, no.2 (2013) : 86-92.doi: 10.6111/JKCGCT.2013.23.2.86