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Characterizations of graded AlGaN epilayer grown by HVPE

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2015, 25(2), pp.45-50
  • DOI : 10.6111/JKCGCT.2015.25.2.045
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

CHANBIN LEE 1 전헌수 1 이찬미 1 Jeon Injun 1 Min Yang 1 Sam Nyung Yi ORD ID 1 Hyung Soo Ahn 1 Kim Suck Whan 2 Young-Moon Yu 3 Nobuhiko Sawaki 4

1한국해양대학교
2안동대학교
3부경대학교
4AIT

Accredited

ABSTRACT

Compositionally graded AlGaN epilayer was grown by HVPE (hydride vapor phase epitaxy) on (0001) c-plane sapphire substrate. During the growth of graded AlGaN epilayer, the temperatures of source and the growth zone were set at 950 o C and 1145 o C, respectively. The growth rate of graded AlGaN epilayer was about 100 nm/hour. The changing of Al contentes was investigated by field emission scanning electron microscope (FE-SEM) and energy dispersive spectroscopy (EDS). From the result of atomic force microscope (AFM), the average of roughness in 2 inch substrate of graded AlGaN epilayer was a few nanometers scale. X-ray diffraction (XRD) with the result that the AlGaN (002) peak (Al0.74Ga0.26N) and AlN (002) peak were appeared. It seems that the graded AlGaN epilayer was successfully grown by the HVPE method. From these results, we expect to use of the graded AlGaN epilayer grown by HVPE for the application of electron and optical devices.

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