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The effects of growth temperatures and V/III ratios at 1000oC for a-plane GaN epi-layer on r-plane sapphire grown by HVPE

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2015, 25(2), pp.56-61
  • DOI : 10.6111/JKCGCT.2015.25.2.056
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

하주형 1 Mi-Seon Park 1 Lee, Won Jae 1 Young Jun Choi 2 Hae Yong Lee 2

1동의대학교
2(주)루미지엔테크

Accredited

ABSTRACT

The effects of the growth temperature on the properties of a-plane GaN epi-layer on r-plane sapphire by HVPE were studied, when the constant V/III ratio and the flow rate of HCl for the Ga source channel was fixed at 10 and 700 sccm, respectively. Additionally the effects of V/III ratios for source gasses were studied when growth temperature and the flow rate of HCl for the Ga source channel was fixed at 1000oC and 700 sccm, respectively. As the growth temperature was increased, the values of Full Width Half Maximum (FWHM) for Rocking curve (RC) of a-plane GaN (11-20) epilayer were decreased and thickness of a-plane GaN epi-layer were increased. As V/III ratios were increased at 1000oC, the values of FWHM for RC of a-plane GaN (11-20) were declined and thickness of a-plane GaN epi-layer were increased. The a-plane GaN (11-20) epi-layer grown at 1000oC and V/III ratio = 10 showed the lowest value FWHM for RC of aplane GaN (11-20) for 734 arcsec and the smallest dependence of Azimuth angle for FWHM of (11-20) RCs.

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