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Thickness optimization of the bulk GaN single crystal grown by HVPE processing variable control

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2017, 27(2), pp.89-93
  • DOI : 10.6111/JKCGCT.2017.27.2.089
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : April 7, 2017
  • Accepted : April 19, 2017
  • Published : April 30, 2017

Jae Hwa Park 1 Hee Ae Lee 1 Joo Hyung Lee 1 Cheol Woo Park 1 Jung Hun Lee 1 Hyo Sang Kang 1 Suk Hyun Kang 2 Sin Young Bang 3 Seong Kuk Lee 2 Kwang Bo Shim 1

1한양대학교
2유니모포트론
3(주)에임즈마이크론

Accredited

ABSTRACT

GaN single crystals were grown by controlling of various processing parameters such as growing temperature, V/III ratio and growing rate. We optimized thickness of bulk GaN single crystal by analyzing defect of surface and inside of the GaN single crystal for application to high brightness and power device. 2-inch bulk GaN single crystals were grown by HVPE (hydride vapor phase epitaxy) on sapphire and their thickness was 0.3~7.0 mm. Crystal structure of the grown bulk GaN was analyzed by XRD (X-ray diffraction). The surface characteristics of the grown bulk GaN were observed by OM (optical microscope) and SEM (scanning electron microscopy) with measuring EPD (etch pits density) of the GaN crystals.

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