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Effect of VI/III ratio on properties of alpha-Ga2O3 epilayers grown by halide vapor phase epitaxy

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2018, 28(3), pp.135~139
  • DOI : 10.6111/JKCGCT.2018.28.3.135
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Published : June 30, 2018

Hoki Son 1,  Ye-ji Choi 1,  Young Jin Lee 1,  Mi-Jai Lee 1,  Jinho Kim 1,  Sun Woog Kim ORD ID 1,  Yong-Ho Ra 1,  Tae-Young Lim 1,  Jonghee Hwang 1,  Dae-Woo Jeon 1

1한국세라믹기술원

Accredited

ABSTRACT

In this study, we report the effect of VI/III ratio on α-Ga2O3 epilayer on sapphire substrate by halide vapor phase epitaxy. The surface of α-Ga2O3 epilayer grown with various VI/III ratios was flat and crack-free. To analyze the optical properties of the α-Ga2O3 epilayers, the transmittance and an optical band gap were measured. The optical band gap was shown to be around 5 eV and showed a proportional increase in VI/III ratios. To determine the crystal quality of alpha gallium oxide grown with a ratio of 23, closed to the theoretical optical band gap, the FWHM was measured by HR-XRD. The calculated dislocation density of screw and edge were 1.5 × 10 7 cm−2 and 5.4 × 10 9 cm−2 , respectively

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