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A study on the nitridation of GaN crystal growth by HVPE method

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2019, 29(4), pp.149-153
  • DOI : 10.6111/JKCGCT.2019.29.4.149
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : August 8, 2019
  • Accepted : August 14, 2019
  • Published : August 31, 2019

Seung Hoon Lee 1 Joo Hyung Lee 1 Hee Ae Lee 1 Oh Nuri 1 Sung Yi 1 Hyo Sang Kang 1 Seong Kuk Lee 2 Jae Duk Yang 2 Jae Hwa Park 2

1한양대학교
2에임즈마이크론(주)

Accredited

ABSTRACT

HVPE is one of the GaN single crystal manufacturing methods which has been commercially widely used due to its high growth rate. HVPE method consists of a number of processes, in particular the nitridation of the substrate prior to GaN growth has a significant effect on the crystalline quality of the manufactured GaN single crystal. In this study, we investigated the effect of nitridation for crystalline quality of GaN when it was grown on the sapphire substrate. The whole growth conditions except for the nitridation process were the same, and the gas flow rate supplied to the sapphire substrate was variously changed during the nitridation. Here, we examined the effect of nitridation via the surface characterization of GaN single crystal grown by HVPE.

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