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Hexagonal shape Si crystal grown by mixed-source HVPE method

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2021, 31(3), pp.103-111
  • DOI : 10.6111/JKCGCT.2021.31.3.103
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : May 17, 2021
  • Accepted : June 9, 2021
  • Published : June 30, 2021

Gang Seok Lee 1 Kyoung-Hwa Kim 1 Jung Hyun Park 1 KIM SO YOON 1 Lee Ha Young 1 Hyung Soo Ahn 1 Jae Hak Lee 1 Young Tea Chun 1 Min Yang 1 Sam Nyung Yi ORD ID 1 InjunJeon 2 Cho, Chae-Ryong 2 Kim Suck Whan 3

1한국해양대학교
2부산대학교
3안동대학교

Accredited

ABSTRACT

Hexagonal shape Si crystals were grown by the mixed-source hydride vapor phase epitaxy (HVPE) method of mixing solid materials such as Si, Al and Ga. In the newly designed atmospheric pressure mixed-source HVPE method,nuclei are formed by the interaction between GaCln, AlCln and SiCln gases at a high temperature of 1200°C. In addition, it is designed to generate a precursor gas with a high partial pressure due to the rapid reaction of Si and HCl gas. The properties of hexagonal Si crystals were investigated through scanning electron microscopy (FE-SEM), energy dispersive X-ray spectroscopy (EDS), high-resolution X-ray diffraction (HR-XRD), and Raman spectrum. From these results, it is expected to be applied as a new material in the Si industry.

Citation status

* References for papers published after 2023 are currently being built.

This paper was written with support from the National Research Foundation of Korea.