@article{ART002728424},
author={Gang Seok Lee and Kyoung-Hwa Kim and Jung Hyun Park and KIM SO YOON and Lee Ha Young and Hyung Soo Ahn and Jae Hak Lee and Young Tea Chun and Min Yang and Sam Nyung Yi and InjunJeon and Cho, Chae-Ryong and Kim Suck Whan},
title={Hexagonal shape Si crystal grown by mixed-source HVPE method},
journal={Journal of the Korean Crystal Growth and Crystal Technology},
issn={1225-1429},
year={2021},
volume={31},
number={3},
pages={103-111},
doi={10.6111/JKCGCT.2021.31.3.103}
TY - JOUR
AU - Gang Seok Lee
AU - Kyoung-Hwa Kim
AU - Jung Hyun Park
AU - KIM SO YOON
AU - Lee Ha Young
AU - Hyung Soo Ahn
AU - Jae Hak Lee
AU - Young Tea Chun
AU - Min Yang
AU - Sam Nyung Yi
AU - InjunJeon
AU - Cho, Chae-Ryong
AU - Kim Suck Whan
TI - Hexagonal shape Si crystal grown by mixed-source HVPE method
JO - Journal of the Korean Crystal Growth and Crystal Technology
PY - 2021
VL - 31
IS - 3
PB - The Korea Association Of Crystal Growth, Inc.
SP - 103
EP - 111
SN - 1225-1429
AB - Hexagonal shape Si crystals were grown by the mixed-source hydride vapor phase epitaxy (HVPE) method of mixing solid materials such as Si, Al and Ga. In the newly designed atmospheric pressure mixed-source HVPE method,nuclei are formed by the interaction between GaCln, AlCln and SiCln gases at a high temperature of 1200°C. In addition, it is designed to generate a precursor gas with a high partial pressure due to the rapid reaction of Si and HCl gas. The properties of hexagonal Si crystals were investigated through scanning electron microscopy (FE-SEM), energy dispersive X-ray spectroscopy (EDS), high-resolution X-ray diffraction (HR-XRD), and Raman spectrum. From these results, it is expected to be applied as a new material in the Si industry.
KW - Hexagonal Si;Cubic Si;Mixed-source HVPE;Si allotrope;Direct bandgap Si
DO - 10.6111/JKCGCT.2021.31.3.103
ER -
Gang Seok Lee, Kyoung-Hwa Kim, Jung Hyun Park, KIM SO YOON, Lee Ha Young, Hyung Soo Ahn, Jae Hak Lee, Young Tea Chun, Min Yang, Sam Nyung Yi, InjunJeon, Cho, Chae-Ryong and Kim Suck Whan. (2021). Hexagonal shape Si crystal grown by mixed-source HVPE method. Journal of the Korean Crystal Growth and Crystal Technology, 31(3), 103-111.
Gang Seok Lee, Kyoung-Hwa Kim, Jung Hyun Park, KIM SO YOON, Lee Ha Young, Hyung Soo Ahn, Jae Hak Lee, Young Tea Chun, Min Yang, Sam Nyung Yi, InjunJeon, Cho, Chae-Ryong and Kim Suck Whan. 2021, "Hexagonal shape Si crystal grown by mixed-source HVPE method", Journal of the Korean Crystal Growth and Crystal Technology, vol.31, no.3 pp.103-111. Available from: doi:10.6111/JKCGCT.2021.31.3.103
Gang Seok Lee, Kyoung-Hwa Kim, Jung Hyun Park, KIM SO YOON, Lee Ha Young, Hyung Soo Ahn, Jae Hak Lee, Young Tea Chun, Min Yang, Sam Nyung Yi, InjunJeon, Cho, Chae-Ryong, Kim Suck Whan "Hexagonal shape Si crystal grown by mixed-source HVPE method" Journal of the Korean Crystal Growth and Crystal Technology 31.3 pp.103-111 (2021) : 103.
Gang Seok Lee, Kyoung-Hwa Kim, Jung Hyun Park, KIM SO YOON, Lee Ha Young, Hyung Soo Ahn, Jae Hak Lee, Young Tea Chun, Min Yang, Sam Nyung Yi, InjunJeon, Cho, Chae-Ryong, Kim Suck Whan. Hexagonal shape Si crystal grown by mixed-source HVPE method. 2021; 31(3), 103-111. Available from: doi:10.6111/JKCGCT.2021.31.3.103
Gang Seok Lee, Kyoung-Hwa Kim, Jung Hyun Park, KIM SO YOON, Lee Ha Young, Hyung Soo Ahn, Jae Hak Lee, Young Tea Chun, Min Yang, Sam Nyung Yi, InjunJeon, Cho, Chae-Ryong and Kim Suck Whan. "Hexagonal shape Si crystal grown by mixed-source HVPE method" Journal of the Korean Crystal Growth and Crystal Technology 31, no.3 (2021) : 103-111.doi: 10.6111/JKCGCT.2021.31.3.103
Gang Seok Lee; Kyoung-Hwa Kim; Jung Hyun Park; KIM SO YOON; Lee Ha Young; Hyung Soo Ahn; Jae Hak Lee; Young Tea Chun; Min Yang; Sam Nyung Yi; InjunJeon; Cho, Chae-Ryong; Kim Suck Whan. Hexagonal shape Si crystal grown by mixed-source HVPE method. Journal of the Korean Crystal Growth and Crystal Technology, 31(3), 103-111. doi: 10.6111/JKCGCT.2021.31.3.103
Gang Seok Lee; Kyoung-Hwa Kim; Jung Hyun Park; KIM SO YOON; Lee Ha Young; Hyung Soo Ahn; Jae Hak Lee; Young Tea Chun; Min Yang; Sam Nyung Yi; InjunJeon; Cho, Chae-Ryong; Kim Suck Whan. Hexagonal shape Si crystal grown by mixed-source HVPE method. Journal of the Korean Crystal Growth and Crystal Technology. 2021; 31(3) 103-111. doi: 10.6111/JKCGCT.2021.31.3.103
Gang Seok Lee, Kyoung-Hwa Kim, Jung Hyun Park, KIM SO YOON, Lee Ha Young, Hyung Soo Ahn, Jae Hak Lee, Young Tea Chun, Min Yang, Sam Nyung Yi, InjunJeon, Cho, Chae-Ryong, Kim Suck Whan. Hexagonal shape Si crystal grown by mixed-source HVPE method. 2021; 31(3), 103-111. Available from: doi:10.6111/JKCGCT.2021.31.3.103
Gang Seok Lee, Kyoung-Hwa Kim, Jung Hyun Park, KIM SO YOON, Lee Ha Young, Hyung Soo Ahn, Jae Hak Lee, Young Tea Chun, Min Yang, Sam Nyung Yi, InjunJeon, Cho, Chae-Ryong and Kim Suck Whan. "Hexagonal shape Si crystal grown by mixed-source HVPE method" Journal of the Korean Crystal Growth and Crystal Technology 31, no.3 (2021) : 103-111.doi: 10.6111/JKCGCT.2021.31.3.103