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Effect of low-temperature GaN grown at different temperature on residual stress of epitaxial GaN

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2022, 32(3), pp.83-88
  • DOI : 10.6111/JKCGCT.2022.32.3.083
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : May 31, 2022
  • Accepted : June 9, 2022
  • Published : June 30, 2022

Seung Hoon Lee 1 Joo Hyung Lee 2 Oh Nuri 2 Sung Yi 2 Hyung Bin Park 3 Ran Hee Shin 3 Jae Hwa Park 3

1한양대학교 세라믹연구소
2한양대학교
3에임즈마이크론(주)

Accredited

ABSTRACT

To improve the crystallinity of GaN, there are researches on surface treatment to control the difference inphysical properties between GaN and heterogeneous substrate. ‘Low-temperature GaN (LT-GaN)’ is one of the ways tosolve the problem and we investigated the relationship between growth temperature and properties of LT-GaN in ourhomemade vertical type HVPE. The LT-GaN nuclei were formed on the sapphire surface at low growth temperatures andthey presented differences in the density and crystallinity depending on the growth temperature. Significantly, the stressrelaxation effect on the epitaxial GaN (epi-GaN) was affected by the crystallinity of LT-GaN. However, the highcrystallinity of LT-GaN exacerbated the crystal quality of epi-GaN because they worked as a catalyst and seed ofpolycrystalline.

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