2009, Vol.19, No.6

Journal of the Korean Crystal Growth and Crystal Technology 2023 KCI Impact Factor : 0.19

pISSN : 1225-1429 / eISSN : 2234-5078
https://journal.kci.go.kr/jkcgct

Superhydrophobic SiO2 thin films were successfully fabricated on a glass substrate by sol-gel method. To fabricate SiO2 thin film with a high roughness, SiO2 nano particles were added into tetraethoxysilane (TEOS) solution. The prepared SiO2 thin film without an addition of SiO2 nano particles showed a very flat surface with ca. 1.27 nm of root mean square (RMS) roughness. Otherwise, the SiO2 thin films fabricated by using coating solutions added SiO2 nano particles of 1.0, 2.0 and 3.0 wt% showed a RMS roughness of ca. 44.10 nm, ca. 69.58 nm, ca. 80.66 nm, respectively. To modify the surfaces of SiO2 thin films to hydrophobic surface, a hydrophobic treatment was carried out using a fluoroalkyltrimethoxysilane (FAS). The SiO2 thin films with a high rough surface were changed from hydrophilic to hydrophobic surface after the FAS treatment. Especially, the prepared SiO2 thin film with a RMS roughness of 80.66 nm showed a water contact angle of 163 o .

NixFe100 − x films with a thickness of about 100nm were deposited on Si(100) substrates at room temperature by a DC magnetron co-sputtering using Fe and Ni targets. Compositional, structural, electrical and magnetic properties of the films were investigated. Ni67Fe33, Ni55Fe45, Ni50Fe50, Ni45Fe55, Ni40Fe60 films are obtained by increasing the sputtering power of the Fe target. The films of x < 55 have BCC structure and show the phase transformation after annealing at the range of 300~450℃ for 2 h. On the other hand, the films of x < 50 have the mixed crystalline phases of BCC and FCC after the annealing treatment. The saturation magnetization was decreased initially by the phase transformation effect but then increased again after annealing at 450℃ due to the grain growth and crystallization of BCC phases.

Hydrophobic/hydrophilic patterned substrates were fabricated on a glass substrate by a liquid phase deposition (LPD) method. Hydrophobic surface was obtained by modifying ZnO thin films with a rough surface using a fluoroalkyltrimethoxysilane (FAS) and hydrophilic surface was prepared by decomposing FAS on an exposed to UV light. The hexagonal ZnO rods were perpendicularly grown by LPD method on glass substrates with a ZnO seed layer. The diameter and thickness of hexagonal ZnO rods were increased as a function of increases of immersion time. The surface morphology, thickness, crystal structure, transmittance and contact angle of prepared ZnO thin films were measured by field emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD), UV-visible spectrophotometer (UV-vis) and contact angle measurement. Hydrophilic ZnO thin films with a contact angle of 20 o ~30 o were changed to a hydrophobic surface with a contact angle of 145 o ~161 o by a FAS surface treatment. Prepared hydrophobic surface was pattered by an irradiation of UV light using shadow mask with 300 μm or 3 mm dot size. Finally, the hydrophobic surface exposed to UV light was changed to a hydrophilic surface.