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Phase transformation and magnetic properties of NixFe100 − x thin films deposited by a co-sputtering

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2009, 19(6), pp.282-287
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering

강대식 1 송조한 1 Nam, Joong-Hee 1 Cho Jeong Ho 1 Myoungpyo Chun 1

1한국세라믹기술원

Accredited

ABSTRACT

NixFe100 − x films with a thickness of about 100nm were deposited on Si(100) substrates at room temperature by a DC magnetron co-sputtering using Fe and Ni targets. Compositional, structural, electrical and magnetic properties of the films were investigated. Ni67Fe33, Ni55Fe45, Ni50Fe50, Ni45Fe55, Ni40Fe60 films are obtained by increasing the sputtering power of the Fe target. The films of x < 55 have BCC structure and show the phase transformation after annealing at the range of 300~450℃ for 2 h. On the other hand, the films of x < 50 have the mixed crystalline phases of BCC and FCC after the annealing treatment. The saturation magnetization was decreased initially by the phase transformation effect but then increased again after annealing at 450℃ due to the grain growth and crystallization of BCC phases.

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