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Characterization of various crystal planes of beta-phase gallium oxide single crystal grown by the EFG method using multi-slit structure

  • Journal of the Korean Crystal Growth and Crystal Technology
  • Abbr : J. Korean Cryst. Growth Cryst. Technol.
  • 2024, 34(1), pp.1-7
  • DOI : 10.6111/JKCGCT.2024.34.1.001
  • Publisher : The Korea Association Of Crystal Growth, Inc.
  • Research Area : Engineering > Materials Science and Engineering
  • Received : January 26, 2024
  • Accepted : February 13, 2024
  • Published : February 29, 2024

Hui-Yeon Jang 1 Su-Min Choi 1 Mi-Seon Park 1 Gwang-Hee Jung 1 Jin-Ki Kang 2 Tae-Kyung Lee 3 Hyoung-Jae Kim 3 Lee, Won Jae 1

1동의대학교
2(주)악셀
3한국생산기술연구원

Accredited

ABSTRACT

β-Ga₂O₃ is a material with a wide band gap of ~4.8eV and a high breakdown-voltage of 8MV/cm, and is attracting much attention in the field of power device applications. In addition, compared to representative WBG semiconductor materials such as SiC, GaN and Diamond, it has the advantage of enabling single crystal growth with high growth rate and low manufacturing cost [1-4]. In this study, we succeeded in growing a 10 mm thick β-Ga₂O₃ singlecrystal doped with 0.3 mol% SnO2 through the EFG (Edge-defined Film-fed Growth) method using multi-slit structure. The growth direction and growth plane were set to [010]/(010), respectively, and the growth speed was about 12 mm/h. The grown β-Ga₂O₃ single crystal was cut into various crystal planes (010, 001, 100, 201) and surface processed. The processed samples were compared for characteristics according to crystal plane through analysis such as XRD, UV/VIS/NIR/Spec., Mercury Probe, AFM and Etching. This research is expected to contribute to the development of power semiconductor technology in high-voltage and high-temperature applications, and selecting a substrate with better characteristics will playan important role in improving device performance and reliability.

Citation status

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