@article{ART003172588},
author={Seong Hyeon Park and Ji-Yeong An and Jong-Min Lim and Ja Hyun Lee},
title={EUV lithography Technology Process Trends and Research Prospects},
journal={Industry Promotion Research},
issn={2466-1139},
year={2025},
volume={10},
number={1},
pages={83-92},
doi={10.21186/IPR.2025.10.1.083}
TY - JOUR
AU - Seong Hyeon Park
AU - Ji-Yeong An
AU - Jong-Min Lim
AU - Ja Hyun Lee
TI - EUV lithography Technology Process Trends and Research Prospects
JO - Industry Promotion Research
PY - 2025
VL - 10
IS - 1
PB - Industrial Promotion Institute
SP - 83
EP - 92
SN - 2466-1139
AB - Entering the era of the 4th industrial revolution, mobile devices (cell phones, automobiles, artificial intelligence robots) are being used in various industrial fields with development of electronic devices and AI technolgies. Among them, semiconductor technology that is harmless to the human body and provides convenience in human life is actively underway. Lithography technology using EUV is being used in the industry, and it is possible to increase precision and shorten the process time by applying a single patterning using a fine wavelength using an Extreme Ultraviolet(EUV) wavelength that uses 13.5 nm than a Deep Ultraviolet(DUV) wavelength of 193nm, which is a wavelength generally used in the industry. However, as the wavelength of EUV is 13.5 nm, if the wavelength is too short, it is not easy to increase the energy of light. Currently, research using EUV wavelengths is actively underway at Samsung Electronics, and various industries are conducting research to increase the light energy of EUV wavelengths. This paper aims to present the improvement of wavelength light energy according to the length of EUV and the future prospects of semiconductors.
KW - EUV lithography;Photoresist;Display;Photochemistry;high-resolution EUV
DO - 10.21186/IPR.2025.10.1.083
ER -
Seong Hyeon Park, Ji-Yeong An, Jong-Min Lim and Ja Hyun Lee. (2025). EUV lithography Technology Process Trends and Research Prospects. Industry Promotion Research, 10(1), 83-92.
Seong Hyeon Park, Ji-Yeong An, Jong-Min Lim and Ja Hyun Lee. 2025, "EUV lithography Technology Process Trends and Research Prospects", Industry Promotion Research, vol.10, no.1 pp.83-92. Available from: doi:10.21186/IPR.2025.10.1.083
Seong Hyeon Park, Ji-Yeong An, Jong-Min Lim, Ja Hyun Lee "EUV lithography Technology Process Trends and Research Prospects" Industry Promotion Research 10.1 pp.83-92 (2025) : 83.
Seong Hyeon Park, Ji-Yeong An, Jong-Min Lim, Ja Hyun Lee. EUV lithography Technology Process Trends and Research Prospects. 2025; 10(1), 83-92. Available from: doi:10.21186/IPR.2025.10.1.083
Seong Hyeon Park, Ji-Yeong An, Jong-Min Lim and Ja Hyun Lee. "EUV lithography Technology Process Trends and Research Prospects" Industry Promotion Research 10, no.1 (2025) : 83-92.doi: 10.21186/IPR.2025.10.1.083
Seong Hyeon Park; Ji-Yeong An; Jong-Min Lim; Ja Hyun Lee. EUV lithography Technology Process Trends and Research Prospects. Industry Promotion Research, 10(1), 83-92. doi: 10.21186/IPR.2025.10.1.083
Seong Hyeon Park; Ji-Yeong An; Jong-Min Lim; Ja Hyun Lee. EUV lithography Technology Process Trends and Research Prospects. Industry Promotion Research. 2025; 10(1) 83-92. doi: 10.21186/IPR.2025.10.1.083
Seong Hyeon Park, Ji-Yeong An, Jong-Min Lim, Ja Hyun Lee. EUV lithography Technology Process Trends and Research Prospects. 2025; 10(1), 83-92. Available from: doi:10.21186/IPR.2025.10.1.083
Seong Hyeon Park, Ji-Yeong An, Jong-Min Lim and Ja Hyun Lee. "EUV lithography Technology Process Trends and Research Prospects" Industry Promotion Research 10, no.1 (2025) : 83-92.doi: 10.21186/IPR.2025.10.1.083
